6 inch full field wafer size nanoimprint lithography for photonic crystals patterning

2010 10th IEEE Conference on Nanotechnology, NANO 2010

Volumn , Issue , 2010, Pages 339-342

  Hornung, Michael ^a   Ji, Ran ^a   Verschuuren, Marc ^b   Van Den Laar, Robert ^b  

^a SUSS MicroTec Lithography GmbH   (United States)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CELL PHONE; ELECTRONIC DEVICE; FLEXIBLE STAMP; FULL-FIELD; IMPRINT LITHOGRAPHY; LARGE-AREA PATTERNING; LIGHT-EXTRACTION EFFICIENCY; LIGHTING MARKET; LUMINOUS EFFICIENCY; PHILIPS; PORTABLE DEVICE; RIGID STAMP; SINGLE-STEP; SOFT STAMPS; SUSS MICROTEC; WAFER LEVEL; WAFER SIZES;

EXTRACTION; LAPTOP COMPUTERS; LIGHT EMITTING DIODES; LIGHTING; NANOTECHNOLOGY; PHOTONIC CRYSTALS; SUBSTRATES; TELECOMMUNICATION EQUIPMENT;

NANOIMPRINT LITHOGRAPHY;

EID: 79951847918     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NANO.2010.5697760     Document Type: Conference Paper

References (6)

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4. M. Verschuuren, H. van Sprang, "3D Photonic Structures by Sol-Gel Imprint Lithography," Mater. Res. Soc. Symp. Proc., Materilas Research Society, 1002-N03-05, Vol. 1002, 2007.
5. M. Beck, et al, "Improving Stamps for 10 nm Level Wafer Scale Nanoimprint Lithography," Microelectronic Engineering 61-62 (2001) 441-448.
6. R. Ji, et al, "UV enhanced substrate conformal imprint lithography (UV-SCIL) technique for photonic crystals patterning in LED manufacturing," Microelectronic Engineering 87 (2010) 963-967.