Large-area roll-to-roll and roll-to-plate Nanoimprint Lithography: A step toward high-throughput application of continuous nanoimprinting

ACS Nano

Volumn 3, Issue 8, 2009, Pages 2304-2310

  Ahn, Se Hyun ^a   Guo, L Jay ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

Flexible substrate; Nanoimprint lithography; Patterning; Residual layer; Roll to roll; Roll toplate

Indexed keywords

FLEXIBLE SUBSTRATE; PATTERNING; RESIDUAL LAYER; ROLL-TO-ROLL; ROLL-TOPLATE;

SUBSTRATES;

NANOIMPRINT LITHOGRAPHY;

EID: 69549086726     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn9003633     Document Type: Article

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