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Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 7, 2011, Pages 6039-6043

Combined laser interference and photolithography patterning of a hybrid mask mold for nanoimprint lithography

(7) Ahn, Sungmo a Choi, Jinnil b Kim, Eunhye b Dong, Ki Young b Jeon, Heonsu a Ju, Byeong Kwon b Lee, Kyu Back b

a Seoul National University (South Korea)

b Korea University (South Korea)

Author keywords

Hybrid Mask Mold; Laser Interference Lithography (LIL); Nanoimprint Lithography; Photolithography

Indexed keywords

DESIGN AND DEVELOPMENT; LASER INTERFERENCE; LASER INTERFERENCE LITHOGRAPHY (LIL); LLOYD'S MIRROR; LOW COSTS; MASK LESS; MICRO-SCALES; NANO SCALE; NANO-SCALE PATTERNS; NANOIMPRINT LITHOGRAPHY PROCESS; NANOSCALE PATTERNING; NANOSCALE STRUCTURE; PATTERN SIZE;

ARGON LASERS; ASPECT RATIO; MIRRORS; MOLDS; NANOIMPRINT LITHOGRAPHY; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; SILICONES;

ELECTROMAGNETIC LAUNCHERS;

EID: 84863078714 PISSN: 15334880 EISSN: None Source Type: Journal
DOI: 10.1166/jnn.2011.4363 Document Type: Conference Paper

Times cited : (6)

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