Deformations of soft imprint templates in the nanoimprint lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8323, Issue , 2012, Pages

  He, Jian ^a,b   Howitz, S ^a   Killge, S ^b   Richter, K ^b   Bartha, J W ^b  

^a Gesellschaft fuer Silizium Mikrosysteme MbH   (Germany)

^b DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

deformation; FEM; Nanoimprint; soft imptint template

Indexed keywords

FINITE ELEMENT METHOD; NANOIMPRINT LITHOGRAPHY;

DEFORMATION BEHAVIOR; IMPRINT RESIST; NANO-IMPRINT; PROCESS DEVELOPMENT; PROCESS PARAMETERS; SINGLE STRUCTURE; SOFT IMPTINT TEMPLATE; TEMPLATE GEOMETRIES;

DEFORMATION;

EID: 84876934431     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.916287     Document Type: Conference Paper

References (5)

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