Nanoimprint with thin and uniform residual layer for various pattern densities

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 611-614

  Hiroshima, Hiroshi ^a,b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Capacity equalized mold; Nanoimprint lithography; Pattern density; Residual layer thickness; UV nanoimprint

Indexed keywords

CAPACITY-EQUALIZED MOLD; LOCAL PATTERN DENSITIES; MOLD PATTERNS; NANO IMPRINTS; PATTERN DENSITY; RESIDUAL LAYER THICKNESS; RESIDUAL LAYERS; STANDARD DEVIATIONS; UV NANOIMPRINT;

FILM THICKNESS; MOLDS; STATISTICS;

NANOIMPRINT LITHOGRAPHY;

EID: 67349208771     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.11.076     Document Type: Article

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