Fluoropolymer synthesis and its application as a mold material in UV-Nano-imprint lithography process

Journal of Nanoscience and Nanotechnology

Volumn 8, Issue 10, 2008, Pages 5341-5346

  Perumal, Jayakumar ^a   Kim, Dong Pyo ^a   Lee, Jae Jong ^b  

^a Chungnam National University   (South Korea)

^b Korea Institute of Machine and Materials   (South Korea)

Author keywords

Fluoropolymer; Nano Patterning; UV NIL

Indexed keywords

FLUOROPOLYMER; FUNCTIONALIZED; IMPRINT LITHOGRAPHIES; IR ANALYSES; LITHOGRAPHIC PROCESSES; MOLD MATERIALS; NANO PATTERNING; PERFLUOROPOLYETHER; PHOTOCURABLE; POLYMERIC MATERIALS; POTENTIAL APPLICATIONS; REACTION MECHANISMS; RIGID MATERIALS; SYNTHESIS OF; UV-NIL;

ADDITION REACTIONS; CHEMICAL REACTIONS; FUNCTIONAL GROUPS; MICROCHANNELS; MOLDS; NANOIMPRINT LITHOGRAPHY; NUCLEAR MAGNETIC RESONANCE; OXIDE MINERALS; PHOTORESISTS; QUARTZ; SILICONES; SYNTHESIS (CHEMICAL);

POLYMERS;

EID: 58149252825     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2008.1280     Document Type: Conference Paper

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