Soft UV-nanoimprint lithography on non-planar surfaces

Microelectronic Engineering

Volumn 88, Issue 11, 2011, Pages 3287-3292

  Farshchian, Bahador ^a   Amirsadeghi, Alborz ^a   Hurst, Steven M ^a   Wu, Jiahao ^a   Lee, Jaejong ^b   Park, Sunggook ^a  

^a Louisiana State University   (United States)

^b Korea Institute of Machine and Materials   (South Korea)

Author keywords

Nanofabrication; Non planar surfaces; PMMA; Thin PDMS stamp; UV NIL

Indexed keywords

CURVATURE RADII; CURVED SURFACES; FLEXIBLE POLYMERS; MICRO AND NANOSTRUCTURES; NANO PATTERN; NON-PLANAR SUBSTRATES; NON-PLANAR SURFACES; PLANAR SUBSTRATE; PMMA; POLYDIMETHYLSILOXANE PDMS; RADII OF CURVATURE; RESIST LAYERS; SHARP EDGES; STEP SURFACE; THIN PDMS STAMP; UV NANOIMPRINT LITHOGRAPHY; UV-NIL;

ESTERS; MICROCHANNELS; MOLDING; NANOTECHNOLOGY;

NANOIMPRINT LITHOGRAPHY;

EID: 80053355739     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2011.07.010     Document Type: Article

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