Adhesion force measurement between the stamp and the resin in ultraviolet nanoimprint lithography--an investigative approach.

Nanotechnology

Volumn 20, Issue 5, 2009, Pages 55704-

  Perumal, Jayakumar ^a   Yoon, Tae Ho ^a   Jang, Hwan Soo ^a   Lee, Jae Jong ^a   Kim, Dong Pyo ^a  

^a Chungnam National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BAYSILON; DIMETICONE; EPOXY RESIN; METHACRYLIC ACID DERIVATIVE; NANOMATERIAL;

ADHESION; ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; MACROMOLECULE; MATERIALS TESTING; MECHANICAL STRESS; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; PHOTOGRAPHY; SURFACE PROPERTY; ULTRASTRUCTURE; ULTRAVIOLET RADIATION;

ADHESIVENESS; CRYSTALLIZATION; DIMETHYLPOLYSILOXANES; EPOXY RESINS; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; METHACRYLATES; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; PHOTOGRAPHY; STRESS, MECHANICAL; SURFACE PROPERTIES; ULTRAVIOLET RAYS;

EID: 67049156244     PISSN: None     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/5/055704     Document Type: Article

References (0)