-
1
-
-
0142037327
-
Imprint of sub 25 nm vias and trenches in polymers
-
Chou S Y, Krauss P R and Renstrom P J 1995 Imprint of sub 25 nm vias and trenches in polymers Appl. Phys. Lett. 67 3114-6
-
(1995)
Appl. Phys. Lett.
, vol.67
, Issue.21
, pp. 3114-3116
-
-
Chou, S.Y.1
Krauss, P.R.2
Renstrom, P.J.3
-
2
-
-
2942558559
-
Recent progress in nanoimprint technology and its applications
-
Guo L J 2004 Recent progress in nanoimprint technology and its applications J. Phys. D: Appl. Phys. 37 123-41
-
(2004)
J. Phys. D: Appl. Phys.
, vol.37
, pp. 123-141
-
-
Guo, L.J.1
-
3
-
-
0012752163
-
Sub-10 nm imprint lithography and applications
-
Chou S Y, Krauss P R, Zhang W, Guo L J and Zhuang L 1997 Sub-10 nm imprint lithography and applications J. Vac. Sci. Technol. B 15 2897-94
-
(1997)
J. Vac. Sci. Technol.
, vol.15
, Issue.6
, pp. 2897-2894
-
-
Chou, S.Y.1
Krauss, P.R.2
Zhang, W.3
Guo, L.J.4
Zhuang, L.5
-
4
-
-
0031074686
-
Imprint lithography with sub 10 nm feature size and high throughput
-
Chou S Y and Krauss P R 1997 Imprint lithography with sub 10 nm feature size and high throughput Microelectron. Eng. 50 237-40
-
(1997)
Microelectron. Eng.
, vol.35
, Issue.1-4
, pp. 237-240
-
-
Chou, S.Y.1
Krauss, P.R.2
-
5
-
-
0032625408
-
Step and flash imprint lithography: An alternative approach to high resolution patterning
-
Colburn M et al 1999 Step and flash imprint lithography: an alternative approach to high resolution patterning Proc. SPIE 3676 379-89
-
(1999)
Proc. SPIE
, vol.3676
, pp. 379-389
-
-
Colburn, M.1
Al, E.2
-
6
-
-
0141791624
-
Improved step and flash imprint lithography templates for nanofabrication
-
Resnick D J, Mancini D, Dauksher W J, Nordquist K, Bailey T C, Johnson S, Sreenivasan S V, Ekerdt J G and Willson C G 2003 Improved step and flash imprint lithography templates for nanofabrication Microelectron. Eng. 69 412-9
-
(2003)
Microelectron. Eng.
, vol.69
, Issue.2-4
, pp. 412-419
-
-
Resnick, D.J.1
Mancini, D.2
Dauksher, W.J.3
Nordquist, K.4
Bailey, T.C.5
Johnson, S.6
Sreenivasan, S.V.7
Ekerdt, J.G.8
Willson, C.G.9
-
7
-
-
0035399945
-
Design of orientation stages for step and flash imprint lithography
-
Choi B J, Screenvasan S V, Johnson S, Choi B J, Sreenivasan S V, Johnson S, Colburn M and Willson C G 2001 Design of orientation stages for step and flash imprint lithography Precis. Eng. 25 192-9
-
(2001)
Precis. Eng.
, vol.25
, Issue.3
, pp. 192-199
-
-
Choi, B.J.1
Screenvasan, S.V.2
Johnson, S.3
Choi, B.J.4
Sreenivasan, S.V.5
Johnson, S.6
Colburn, M.7
Willson, C.G.8
-
8
-
-
0141724812
-
Design and performance of a step and repeat imprinting machine
-
McMackin I, Schumaker P, Babbs D, Choi J, Collison W, Schumaker N, Watts M, Voisin R and Sreenivasan S V 2003 Design and performance of a step and repeat imprinting machine Proc. SPIE 5037 I 178-86
-
(2003)
Proc. SPIE
, vol.5037
, pp. 178-186
-
-
McMackin, I.1
Schumaker, P.2
Babbs, D.3
Choi, J.4
Collison, W.5
Schumaker, N.6
Watts, M.7
Voisin, R.8
Sreenivasan, S.V.9
-
9
-
-
34247595491
-
Improved mold fabrication for the definition of high quality nanopatterns by soft UV-nanoimprint lithography using diluted PDMS material
-
Koo N, Bender M, Plachetka U, Fuchs A, Wahlbrink T, Bolten J and Kurz H 2007 Improved mold fabrication for the definition of high quality nanopatterns by soft UV-nanoimprint lithography using diluted PDMS material Microelectron. Eng. 84 904-8
-
(2007)
Microelectron. Eng.
, vol.84
, Issue.5-8
, pp. 904-908
-
-
Koo, N.1
Bender, M.2
Plachetka, U.3
Fuchs, A.4
Wahlbrink, T.5
Bolten, J.6
Kurz, H.7
-
11
-
-
34748826175
-
High-precision orientation stage for room-temperature imprint lithography
-
Yan L, Lu B H, Ding Y C, Liu H Z and Li H S 2004 High-precision orientation stage for room-temperature imprint lithography China Mech. Eng. 15 75-8 (in Chinese)
-
(2004)
China Mech. Eng.
, vol.15
, Issue.1
, pp. 75-78
-
-
Yan, L.1
Lu, B.H.2
Ding, Y.C.3
Liu, H.Z.4
Li, H.S.5
-
12
-
-
33847651792
-
Review of the wafer stage for nanoimprint lithography
-
Lan H B, Ding Y C, Liu H Z and Lu B H 2006 Review of the wafer stage for nanoimprint lithography Microelectron. Eng. 84 684-8
-
(2006)
Microelectron. Eng.
, vol.84
, Issue.4
, pp. 684-688
-
-
Lan, H.B.1
Ding, Y.C.2
Liu, H.Z.3
Lu, B.H.4
-
13
-
-
0010226283
-
Layer-to-layer alignment for step and flash imprint lithography
-
Choi B J, Meissl M, Colbum M, Bailey T, Ruchhoeft P, Sreenivasan S V, Prins F, Banerjee S, Ekerdt J G and Willson C G 2001 Layer-to-layer alignment for step and flash imprint lithography Proc. SPIE 4343 436-42
-
(2001)
Proc. SPIE
, vol.4343
, pp. 436-442
-
-
Choi, B.J.1
Meissl, M.2
Colbum, M.3
Bailey, T.4
Ruchhoeft, P.5
Sreenivasan, S.V.6
Prins, F.7
Banerjee, S.8
Ekerdt, J.G.9
Willson, C.G.10
-
14
-
-
33646430860
-
Novel nano-scale overlay alignment method for room-temperature imprint lithography
-
Wang L, Ding Y C, Lu B H, Qiu Z H and Liu H Z 2006 Novel nano-scale overlay alignment method for room-temperature imprint lithography Proc. SPIE 6149 61491V
-
(2006)
Proc. SPIE
, vol.6149
-
-
Wang, L.1
Ding, Y.C.2
Lu, B.H.3
Qiu, Z.H.4
Liu, H.Z.5
-
15
-
-
34249700112
-
A measurement system for step imprint lithography
-
Liu H Z, Lu B H, Ding Y C, Li D C, Tang Y P and Jin T 2005 A measurement system for step imprint lithography Key Eng. Mater. 295-296 107-11
-
(2005)
Key Eng. Mater.
, vol.295-296
, pp. 107-111
-
-
Liu, H.Z.1
Lu, B.H.2
Ding, Y.C.3
Li, D.C.4
Tang, Y.P.5
Jin, T.6
-
16
-
-
33244462834
-
Distortion reduction by load release for imprint lithography
-
Li H S, Ding Y C, Tang Y P, Liu H Z and Lu B H 2006 Distortion reduction by load release for imprint lithography Microelectron. Eng. 83 485-91
-
(2006)
Microelectron. Eng.
, vol.83
, Issue.3
, pp. 485-491
-
-
Li, H.S.1
Ding, Y.C.2
Tang, Y.P.3
Liu, H.Z.4
Lu, B.H.5
|