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Volumn 17, Issue 10, 2007, Pages 2039-2048

Development of a step micro-imprint lithography tool

Author keywords

[No Author keywords available]

Indexed keywords

MICROMACHINING; MICROMETERS; OPTIMIZATION; PATTERN RECOGNITION; ULTRAVIOLET RADIATION;

EID: 34748815130     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/17/10/016     Document Type: Article
Times cited : (10)

References (16)
  • 1
    • 0142037327 scopus 로고
    • Imprint of sub 25 nm vias and trenches in polymers
    • Chou S Y, Krauss P R and Renstrom P J 1995 Imprint of sub 25 nm vias and trenches in polymers Appl. Phys. Lett. 67 3114-6
    • (1995) Appl. Phys. Lett. , vol.67 , Issue.21 , pp. 3114-3116
    • Chou, S.Y.1    Krauss, P.R.2    Renstrom, P.J.3
  • 2
    • 2942558559 scopus 로고    scopus 로고
    • Recent progress in nanoimprint technology and its applications
    • Guo L J 2004 Recent progress in nanoimprint technology and its applications J. Phys. D: Appl. Phys. 37 123-41
    • (2004) J. Phys. D: Appl. Phys. , vol.37 , pp. 123-141
    • Guo, L.J.1
  • 4
    • 0031074686 scopus 로고    scopus 로고
    • Imprint lithography with sub 10 nm feature size and high throughput
    • Chou S Y and Krauss P R 1997 Imprint lithography with sub 10 nm feature size and high throughput Microelectron. Eng. 50 237-40
    • (1997) Microelectron. Eng. , vol.35 , Issue.1-4 , pp. 237-240
    • Chou, S.Y.1    Krauss, P.R.2
  • 5
    • 0032625408 scopus 로고    scopus 로고
    • Step and flash imprint lithography: An alternative approach to high resolution patterning
    • Colburn M et al 1999 Step and flash imprint lithography: an alternative approach to high resolution patterning Proc. SPIE 3676 379-89
    • (1999) Proc. SPIE , vol.3676 , pp. 379-389
    • Colburn, M.1    Al, E.2
  • 9
    • 34247595491 scopus 로고    scopus 로고
    • Improved mold fabrication for the definition of high quality nanopatterns by soft UV-nanoimprint lithography using diluted PDMS material
    • Koo N, Bender M, Plachetka U, Fuchs A, Wahlbrink T, Bolten J and Kurz H 2007 Improved mold fabrication for the definition of high quality nanopatterns by soft UV-nanoimprint lithography using diluted PDMS material Microelectron. Eng. 84 904-8
    • (2007) Microelectron. Eng. , vol.84 , Issue.5-8 , pp. 904-908
    • Koo, N.1    Bender, M.2    Plachetka, U.3    Fuchs, A.4    Wahlbrink, T.5    Bolten, J.6    Kurz, H.7
  • 11
    • 34748826175 scopus 로고    scopus 로고
    • High-precision orientation stage for room-temperature imprint lithography
    • Yan L, Lu B H, Ding Y C, Liu H Z and Li H S 2004 High-precision orientation stage for room-temperature imprint lithography China Mech. Eng. 15 75-8 (in Chinese)
    • (2004) China Mech. Eng. , vol.15 , Issue.1 , pp. 75-78
    • Yan, L.1    Lu, B.H.2    Ding, Y.C.3    Liu, H.Z.4    Li, H.S.5
  • 12
    • 33847651792 scopus 로고    scopus 로고
    • Review of the wafer stage for nanoimprint lithography
    • Lan H B, Ding Y C, Liu H Z and Lu B H 2006 Review of the wafer stage for nanoimprint lithography Microelectron. Eng. 84 684-8
    • (2006) Microelectron. Eng. , vol.84 , Issue.4 , pp. 684-688
    • Lan, H.B.1    Ding, Y.C.2    Liu, H.Z.3    Lu, B.H.4
  • 14
    • 33646430860 scopus 로고    scopus 로고
    • Novel nano-scale overlay alignment method for room-temperature imprint lithography
    • Wang L, Ding Y C, Lu B H, Qiu Z H and Liu H Z 2006 Novel nano-scale overlay alignment method for room-temperature imprint lithography Proc. SPIE 6149 61491V
    • (2006) Proc. SPIE , vol.6149
    • Wang, L.1    Ding, Y.C.2    Lu, B.H.3    Qiu, Z.H.4    Liu, H.Z.5
  • 16
    • 33244462834 scopus 로고    scopus 로고
    • Distortion reduction by load release for imprint lithography
    • Li H S, Ding Y C, Tang Y P, Liu H Z and Lu B H 2006 Distortion reduction by load release for imprint lithography Microelectron. Eng. 83 485-91
    • (2006) Microelectron. Eng. , vol.83 , Issue.3 , pp. 485-491
    • Li, H.S.1    Ding, Y.C.2    Tang, Y.P.3    Liu, H.Z.4    Lu, B.H.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.