Press and release imprint: Control of the flexible mold deformation and the local variation of residual layer thickness in soft UV-NIL

Microelectronic Engineering

Volumn 88, Issue 6, 2011, Pages 1033-1036

  Koo, Namil ^a   Otto, Martin ^a   Kim, Jung Wuk ^a   Jeong, Jun Ho ^b   Kurz, Heinrich ^a  

^a AMO GMBH   (Germany)

^b Korea Institute of Machine and Materials   (South Korea)

Author keywords

Nanoimprint; PDMS mold deformation; Residual layer; Soft lithography; Soft UV NIL

Indexed keywords

NANO-IMPRINT; PDMS MOLD DEFORMATION; RESIDUAL LAYER; SOFT LITHOGRAPHY; SOFT UV-NIL;

DEFORMATION; MICROCHANNELS; MOLDS; PRESSES (MACHINE TOOLS); PRESSURE EFFECTS;

NANOIMPRINT LITHOGRAPHY;

EID: 79952449457     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2011.01.073     Document Type: Article

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