Ultraviolet-nanoimprint of 40 nm scale patterns using functionally modified fluorinated hybrid materials

Nanotechnology

Volumn 17, Issue 13, 2006, Pages 3319-3324

  Kim, Woo Soo ^a   Choi, Dae Geun ^b   Bae, Byeong Soo ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Korea Institute of Machine and Materials   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; LITHOGRAPHY; MONOMERS; NANOSTRUCTURED MATERIALS; SURFACE TENSION; VISCOSITY;

ACRYL MONOMERS; FLUORINATED ORGANIC-INORGANIC HYBRID MATERIALS (F-HYBRIMERS); NANOIMPRINT LITHOGRAPHY (NIL);

ULTRAVIOLET DEVICES;

EID: 33746626110     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/17/13/040     Document Type: Article

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