Polymer imprint lithography with molecular-scale resolution

Nano Letters

Volumn 4, Issue 12, 2004, Pages 2467-2471

  Hua, Feng ^a   Sun, Yugang ^a   Gaur, Anshu ^a   Meitl, Matthew A ^a   Bilhaut, Lise ^a   Rotkina, Lolita ^a   Wang, Jingfeng ^a   Geil, Phil ^a   Shim, Moonsub ^a   Rogers, John A ^a   Shim, Anne ^b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b DOW CORNING CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY (EBL); NEXT GENERATION LITHOGRAPHY (NGL); POLYMER IMPRINT LITHOGRAPHY; SINGLE WALLED CARBON NANOTUBES;

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; FABRICATION; METHANE; NANOTECHNOLOGY; OPTICS; PHOTOLITHOGRAPHY;

CARBON NANOTUBES;

EID: 10844291014     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl048355u     Document Type: Article

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