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Journal of Nanoscience and Nanotechnology

Volumn 12, Issue 7, 2012, Pages 5336-5341

Pattern uniformity in large-area ultraviolet nano-imprinting by a cylindrically in?ated flexible mold under low pressure

(6) Kim, Geehong a Jeong, Mira a Lim, Hyungjun a Lee, Jaejong a Choi, Kee Bong a Do, Lee Mi b

a Korea Institute of Machine and Materials (South Korea)

b Electronics and Telecommunications Research Institute (ETRI) (South Korea)

Author keywords

Flexible Mold; Low Pressure Process; Nanoimprint Lithography; PDMS

Indexed keywords

AIR BUBBLES; CONTACT FORCES; CONTACT REGIONS; CYLINDRICAL SHAPES; LINE CONTACT; LOW AIR PRESSURE; LOW PRESSURES; NANO-IMPRINT; PDMS; PDMS MOLDS; POLYDIMETHYLSILOXANE PDMS; PRESSURE CONDITIONS; ULTRAVIOLET NANO-IMPRINTING; ULTRAVIOLET-CURABLE RESINS;

ATMOSPHERIC PRESSURE; MICROCHANNELS; MOLDS; NANOIMPRINT LITHOGRAPHY; RESINS;

SILICONES;

EID: 84865115876 PISSN: 15334880 EISSN: 15334899 Source Type: Journal
DOI: 10.1166/jnn.2012.6268 Document Type: Article

Times cited : (2)

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