Reverse nanoimprint lithography for fabrication of nanostructures

Nanoscience and Nanotechnology Letters

Volumn 4, Issue 8, 2012, Pages 835-838

  Tavakkoli, A K G ^a,b   Ranjbar, M ^a,c   Piramanayagam, S N ^a   Wong, S K ^a   Poh, W C ^a   Sbiaa, R ^a   Chong, T C ^a,c  

^a DATA STORAGE INSTITUTE   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^c NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Molding Pressure; Nanofabrication; Residual Layer; Reverse Nanoimprint Lithography

Indexed keywords

LOW PRESSURES; MOLDING PRESSURE; NANOSCALE STRUCTURE; RECORDING MEDIA; RESIDUAL LAYERS; SCANNING ELECTRON MICROSCOPE; TRACK PITCH; ULTRA-VIOLET; UV-IMPRINTING PROCESS; VERY LOW TEMPERATURES;

MOLDING; NANOSTRUCTURES; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY;

NANOIMPRINT LITHOGRAPHY;

EID: 84865761377     PISSN: 19414900     EISSN: 19414919     Source Type: Journal    
DOI: 10.1166/nnl.2012.1424     Document Type: Article

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