An ultraviolet-curable mold for Sub-100-nm lithography

Journal of the American Chemical Society

Volumn 126, Issue 25, 2004, Pages 7744-7745

  Choi, Se Jin ^a   Yoo, Pil J ^b   Baek, Seung J ^a   Kim, Tae W ^a   Lee, Hong H ^b  

^a Minuta Tech   (South Korea)

^b Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELASTOMER; EPOXY RESIN; POLYSILOXANE; POLYURETHAN;

ARTICLE; COMPOSITE MATERIAL; DEVICE; ENERGY; HARD CONTACT LENS; LIQUID; LITHOGRAPHY; NANOTECHNOLOGY; PATTERN GENERATOR; POLYMERIZATION; REACTION ANALYSIS; RIGIDITY; STRUCTURE ANALYSIS; SYNTHESIS; ULTRAVIOLET RADIATION; YOUNG MODULUS;

EID: 3042694518     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja048972k     Document Type: Article

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