Improved performance of polarization-stable VCSELs by monolithic sub-wavelength gratings produced by soft nano-imprint lithography

Nanotechnology

Volumn 22, Issue 50, 2011, Pages

  Verschuuren, M A ^a   Gerlach, P ^b   Van Sprang, H A ^a   Polman, A ^c  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Germany)

^c FOM INSTITUTE AMOLF   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION LOSS; DIFFRACTIVE GRATING; E-BEAM LITHOGRAPHY; ENHANCED EFFICIENCY; ETCH MASK; GAAS; IMPRINT RESIST; LASER CAVITY; NANO-IMPRINT; OUTPUT MIRRORS; SINGLE MODE; SINGLE MODE VCSEL; SOFT-LITHOGRAPHY; SUB-WAVE LENGTH GRATING; SUB-WAVELENGTH; SURFACE GRATING; VERTICAL CAVITY SURFACE EMITTING LASER;

DIFFRACTION GRATINGS; ELECTRON BEAM LITHOGRAPHY; LASER RESONATORS; MIRRORS; POLARIZATION; SILICA; SURFACE EMITTING LASERS;

NANOIMPRINT LITHOGRAPHY;

EID: 82455167175     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/50/505201     Document Type: Article

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