SCOPUS 정보 검색 플랫폼

ECS Journal of Solid State Science and Technology

Volumn 1, Issue 6, 2012, Pages

Film Property Requirements for Hermetic Low-k a-SiOxC yNz:H Dielectric Barriers

(10) King, S W a Jacob, D a Vanleuven, D a Colvin, B a Kelly, J a French, M a Bielefeld, J a Dutta, D b Liu, M b Gidley, D b

a INTEL CORPORATION (United States)

b UNIVERSITY OF MICHIGAN (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84872385833 PISSN: 21628769 EISSN: 21628777 Source Type: Journal
DOI: 10.1149/2.021206jss Document Type: Article

Times cited : (62)

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