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Volumn 82, Issue 3-4 SPEC. ISS., 2005, Pages 411-415

Lateral solvent diffusion characterization of low k dielectric plasma damage and ALD barrier film closure

Author keywords

ALD; Low k; Plasma damage; Solvent diffusion

Indexed keywords

DIELECTRIC FILMS; DIFFUSION; ELLIPSOMETRY; OPTICAL MICROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POROSITY; TOLUENE;

EID: 28044468632     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.07.024     Document Type: Conference Paper
Times cited : (10)

References (12)
  • 2
    • 28044447042 scopus 로고    scopus 로고
    • Proceedings of the 2003 MRS Spring Meeting, San Francisco, CA
    • D. Shamiryan, and K. Maex Proceedings of the 2003 MRS Spring Meeting, San Francisco, CA Mater. Res. Soc. Proc. 786 2003 E.9.11
    • (2003) Mater. Res. Soc. Proc. , vol.786
    • Shamiryan, D.1    Maex, K.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.