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Volumn 82, Issue 3-4 SPEC. ISS., 2005, Pages 411-415
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Lateral solvent diffusion characterization of low k dielectric plasma damage and ALD barrier film closure
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Author keywords
ALD; Low k; Plasma damage; Solvent diffusion
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Indexed keywords
DIELECTRIC FILMS;
DIFFUSION;
ELLIPSOMETRY;
OPTICAL MICROSCOPY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POROSITY;
TOLUENE;
ALD;
LOW-K;
PLASMA DAMAGE;
SOLVENT DIFFUSION;
SOLVENTS;
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EID: 28044468632
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mee.2005.07.024 Document Type: Conference Paper |
Times cited : (10)
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References (12)
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