Elastic modulus of low-A: Dielectric thin films measured by load-dependent contact-resonance atomic force microscopy

Journal of Materials Research

Volumn 24, Issue 9, 2009, Pages 2960-2964

  Stan, Gheorghe ^a   King, Sean W ^b   Cook, Robert F ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESIVE FORCE; AFM; AFM CANTILEVERS; APPLIED FORCES; CONTACT RESONANCE; DIELECTRIC THIN FILMS; DISPLACEMENT RESPONSE; LOW-K DIELECTRIC THIN FILMS; PICOSECOND LASER; RESONANCE FREQUENCY SHIFT;

ATOMIC FORCE MICROSCOPY; DIELECTRIC FILMS; ELASTIC MODULI; PROBES; THIN FILMS;

RESONANCE;

EID: 70350148074     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2009.0357     Document Type: Article

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