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Volumn , Issue , 2008, Pages 435-482

ESR of interfaces and nanolayers in semiconductor heterostructures

Author keywords

dielectric layers; electron spin resonance; hydrogen; interfaces; point defects; semiconductor heterostructures; thermal silica

Indexed keywords


EID: 79951834746     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1016/B978-0-444-53099-8.00013-0     Document Type: Chapter
Times cited : (11)

References (195)
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    • R.J. Carter, E. Carier, M. Caymax, et al. (2001) International Workshop on Gate Insulators. S. Ohmi, F. Fujita, H.S. Momose (Eds) Jap. Soc. of Appl. Phys. 24. Tokyo
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    • Carter, R.J.1    Carier, E.2    Caymax, M.3
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    • G. Pacchioni, L. Skuja, D.L. Griscom (Eds), Dordrecht: Kluwer, For a recent theoretical review, see
    • G. Pacchioni (2000) Defects in SiO2 and Related Dielectrics: Science and Technology, NATO Science Series. G. Pacchioni, L. Skuja, D.L. Griscom (Eds) Dordrecht: Kluwer 161. For a recent theoretical review, see
    • (2000) 2 and Related Dielectrics: Science and Technology, NATO Science Series , pp. 161
    • Pacchioni, G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.