Hydrogen-induced thermal interface degradation in (111) Si/SiO2 revealed by electron-spin resonance

Applied Physics Letters

Volumn 72, Issue 18, 1998, Pages 2271-2273

  Stesmans, A ^a   Afanas'ev, V V ^a  

^a UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001337609     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121335     Document Type: Article

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