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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 4, 2002, Pages 1332-1340

Critical issues in the heteroepitaxial growth of alkaline-earth oxides on silicon

(3) Lettieri, J a Haeni, J H a Schlom, D G a

a PENNSYLVANIA STATE UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; INTERFACES (MATERIALS); MOLECULAR BEAM EPITAXY; OXIDATION; PHASE TRANSITIONS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SILICON; STRAIN;

ALKALINE EARTH OXIDES; HETEROEPITAXIAL GROWTH; QUARTZ CRYSTAL MICROBALANCE;

OXIDES;

EID: 0036649104 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1482710 Document Type: Article

Times cited : (132)

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