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Journal of Applied Physics

Volumn 85, Issue 9, 1999, Pages 6577-6588

Relationship between oxide density and charge trapping in SiO2 films

(5) Mrstik, B J a Afanas'ev, V V b Stesmans, A b McMarr, P J a,d Lawrence, R K c

a NAVAL RESEARCH LABORATORY (United States)

b UNIVERSITY OF LEUVEN (Belgium)

c ARACOR (United States)

d SFA INC (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001518203 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.370164 Document Type: Article

Times cited : (55)

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