Nature and stability of the (100)Si/LaAlO 3 interface probed by paramagnetic defects

Applied Physics Letters

Volumn 89, Issue 11, 2006, Pages

  Stesmans, A ^a   Clemer K ^a   Afanas'ev, V V ^a   Edge, L F ^b   Schlom, D G ^b  

^a UNIVERSITY OF LEUVEN   (Belgium)

^b PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECT DENSITY; INTERFACE DEFECTS; PARAMAGNETIC DEFECTS;

ANNEALING; CRYSTALLIZATION; LANTHANUM COMPOUNDS; PARAMAGNETIC RESONANCE; PARAMAGNETISM; SILICA; THERMODYNAMIC STABILITY;

INTERFACES (MATERIALS);

EID: 33748757943     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2219334     Document Type: Article

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