An electron paramagnetic resonance study of the Si(1 0 0)/Al2O3 interface defects

Journal of Non-Crystalline Solids

Volumn 303, Issue 1, 2002, Pages 175-178

  Cantin, J L ^a   Von Bardeleben, H J ^a  

^a UNIVERSITÉ PARIS DESCARTES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; INTERFACES (MATERIALS); PARAMAGNETIC RESONANCE; SPECTROSCOPIC ANALYSIS; ULTRATHIN FILMS;

GAS ANNEALING;

SEMICONDUCTING SILICON;

EID: 0036567723     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(02)00981-X     Document Type: Article

References (14)