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Volumn 46, Issue 8, 2003, Pages 789-820

Defect-impurity engineering in implanted silicon

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELDS; IMPURITIES; IONIZATION; REACTION KINETICS; RESIDUAL STRESSES; SILICON;

EID: 33748706167     PISSN: 10637869     EISSN: None     Source Type: Journal    
DOI: 10.1070/PU2003v046n08ABEH001371     Document Type: Review
Times cited : (15)

References (348)
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    • Liefting R, PhD Thesis Degree (Enschede: Univ. of Twente, 1992)
    • (1992)
    • Liefting, R.1
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.