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Volumn 72, Issue 2, 2000, Pages 67-72
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Defect reaction and its application to silicon materials technology
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Author keywords
[No Author keywords available]
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Indexed keywords
COPPER;
CRYSTAL DEFECTS;
CRYSTAL IMPURITIES;
IRON;
MORPHOLOGY;
NUMERICAL METHODS;
OXYGEN;
STRENGTHENING (METAL);
THERMODYNAMIC STABILITY;
COPPER IMPURITIES;
DEFECT REACTION;
METALLIC IMPURITIES;
OXYGEN IMPURITIES;
SILICON IMPURITIES;
SILICON MATERIALS TECHNOLOGY;
STRUCTURAL DEFECTS;
SILICON WAFERS;
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EID: 0033904941
PISSN: 09215107
EISSN: None
Source Type: Journal
DOI: 10.1016/S0921-5107(99)00495-X Document Type: Article |
Times cited : (10)
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References (21)
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