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Volumn 72, Issue 2, 2000, Pages 67-72

Defect reaction and its application to silicon materials technology

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; CRYSTAL DEFECTS; CRYSTAL IMPURITIES; IRON; MORPHOLOGY; NUMERICAL METHODS; OXYGEN; STRENGTHENING (METAL); THERMODYNAMIC STABILITY;

EID: 0033904941     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(99)00495-X     Document Type: Article
Times cited : (10)

References (21)
  • 1
    • 0020590222 scopus 로고
    • Defects in Semiconductors II
    • in: S. Mahajan, J.W. Corbett (Eds.) North-Holland, New York
    • K. Sumino, in: S. Mahajan, J.W. Corbett (Eds.) Defects in Semiconductors II, MRS Symposia Proceedings, vol. 14, North-Holland, New York, 1983, pp. 307.
    • (1983) MRS Symposia Proceedings , vol.14 , pp. 307
    • Sumino, K.1
  • 2
  • 5
    • 77957007222 scopus 로고
    • Oxygen in silicon
    • Shimura F. New York: Academic Press
    • Sumino K., Yonenaga I. Oxygen in silicon. Shimura F. Semiconductors and Semimetals. 42:1994;449 Academic Press, New York.
    • (1994) Semiconductors and Semimetals , vol.42 , pp. 449
    • Sumino, K.1    Yonenaga, I.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.