Enhanced nucleation of oxide precipitates during Czochralski silicon crystal growth with nitrogen doping

Journal of Applied Physics

Volumn 88, Issue 6, 2000, Pages 3705-3707

  Aihara, K ^a   Takeno, H ^a   Hayamizu, Y ^a   Tamatsuka, M ^a   Masui, T ^a  

^a SHIN ETSU CHEMICAL CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000673568     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1288157     Document Type: Article

References (9)

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