Comparison of Cu gettering to H+ and He+ implantation-induced cavities in separation-by-implantation-of-oxygen wafers

Journal of Applied Physics

Volumn 85, Issue 1, 1999, Pages 94-98

  Zhang, Miao ^a   Lin, Chenglu ^a   Duo, Xinzhong ^a   Lin, Zixin ^a   Zhou, Zuyao ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002575643     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.369426     Document Type: Review

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