Carbon incorporation into Si at high concentrations by ion implantation and solid phase epitaxy

Journal of Applied Physics

Volumn 79, Issue 2, 1996, Pages 637-646

  Strane, J W ^a   Lee, S R ^b   Stein, H J ^b   Picraux, S T ^b   Watanabe, J K ^c   Mayer, J W ^d  

^a Department of Population Medicine and Diagnostic Sciences   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c MOTOROLA INC   (United States)

^d ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000122741     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.360806     Document Type: Article

References (35)

1. A. R. Powell, K. Eberl, F. E. Legoues, B. A. Ek, and S. S. Iyer, J. Vac. Sci. Technol. B 11, 1064 (1993).
2. E. Kasper, Phys. Scr. T35, 232 (1990).
3. A. R. Bean and R. C. Newman, J. Phys. Chem. Solids 32, 1211 (1971).
4. J. S. Williams, Surface Modification and Alloying by Laser, Ion, and Electron Beam, edited by J. M. Poate, G. Foti, and D. C. Jacobson (Plenum, New York, 1983), p. 133.
5. U. Gösele, Mater. Res. Soc. Symp. Proc. 59, 419 (1985).
6. E. F. Kennedy, L. Csepregi, J. W. Mayer, and T. W. Sigmon, J. Appl. Phys. 48, 4241 (1977).
7. S. Chevacharoenkul, J. R. Ilzhoefer, D. Feijoo, and U. Gösele, Appl. Phys. Lett. 58, 1434 (1991).
8. Q. Z. Hong, J. G. Zhu, J. W. Mayer, W. Xia, and S. S. Lau, J. Appl. Phys. 71, 1768 (1992).
9. S. Y. Shiryaev, M. Fyhn, and A. Nylandlsted Larsen, Appl. Phys. Lett. 63, 3476 (1993); F. Corni, R. Tonini, G. Ottaviani, M. Servidori, and F. Priolo, Thin Solid Films 222, 176 (1992).
10. S. Y. Shiryaev, M. Fyhn, and A. Nylandlsted Larsen, Appl. Phys. Lett. 63, 3476 (1993); F. Corni, R. Tonini, G. Ottaviani, M. Servidori, and F. Priolo, Thin Solid Films 222, 176 (1992).
11. D. C. Paine, D. J. Howard, N. G. Stoffel, and J. A. Horton, J. Mater. Res. 5, 1023 (1990).
12. C. Lee, T. E. Haynes, and K. S. Jones, Appl. Phys. Lett. 62, 501 (1993).
13. H. J. Stein, Proceedings of the II. International Conference on Ion Implantation in Semiconductors, edited by I. Raul and J. Ruge (Springer, Berlin, 1991), p. 2.
14. A. G. Cullis, R. Serles, H. C. Webber, and N. G. Chew. Semiconductor Silicon 1981, edited by F. Huff, R. J. Krieger, and Y. Takeishi (Electrochemical Society, Pennington, NJ, 1981), p. 518.
15. K. Kramer and M. O. Thompson (unpublished).
16. J. W. Strane, H. J. Stein, S. R. Lee, B. L. Doyle, S. T. Picraux, and J. W. Mayer, Appl. Phys. 63, 2789 (1993).
17. L. C. Feldman, J. W. Mayer, and S. T. Picraux, Materials Analysis by Ion Channeling (Academic, New York, 1982), p. 61.
18. P. Revesz, J. Li, G. Vizkelethy, and J. W. Mayer, Nucl. Instrum. Methods B 58, 132 (1991).
19. S. Im, J. Washburn, R. Gronsky, N. W. Cheung, and K. Man Yu, Appl. Phys. Lett. 63, 929 (1993).
20. G. L. Olson and J. A. Roth, Mater. Sci. Repts. 3, 1 (1988).
21. R. C. Newman and J. B. Willis, J. Phys. Chem. Solids 26, 373 (1965).
22. W. G. Spritzer, D. A. Kleinman, and C. J. Frosch, Phys. Rev. 113, 133 (1959).
23. I. P. Akimchenko, K. F. Kisseleva, V. V. Krasnopvtsev, A. G. Touryanski, and V. S. Vavilov, Radiat. Eff. 48, 7 (1980).
24. Annual Book of ASTM Standards (American Society for Testing and Materials, 1986), Designation F123, Section 10.
25. Q. Sun, K. H. Yao, J. Lagowski, and H. C. Gatos, J. Appl. Phys. 67, 4313 (1990).
26. S. Nishikawa and T. Yamaji, Appl. Phys. Lett. 62, 303 (1993).
27. R. C. Newman and J. Wakefield, Proceedings of the International Conference on Solid State Physics in Electronics and Telecommunications, 1960 (unpublished), p. 318.
28. E. Nygren, A. P. Pogany, K. T. Short, J. S. Williams, R. G. Elliman, and J. M. Poate, Appl. Phys. Lett. 52, 439 (1988).
29. W. J. Taylor, T. Y. Tan, and U. Gösele, Appl. Phys. Lett. 62, 25 (1993).
30. S. U. Campisano, G. Foti, P. Baeri, M. G. Grimaldi, and E. Rimini, Appl. Phys. Lett. 37, 719 (1980).
31. J. S. Williams and R. G. Elliman, Appl. Phys. Lett. 40, 266 (1982).
32. J. S. Williams, in Ref. 4. p. 133.
33. J. Narayan and O. W. Holland, Phys. Status Solidi B 73, 225 (1982).
34. J. Narayan, G. L. Olson, and O. W. Holland, Mater. Res. Soc. Symp. Proc. 4, 183 (1982).
35. C. W. White, D. M. Zehner, S. U. Campisano, and A. G. Cullis, in Ref. 4, p. 81.