Carbon incorporation into Si at high concentrations by ion implantation and solid phase epitaxy

Journal of Applied Physics

Volumn 79, Issue 2, 1996, Pages 637-646

  Strane, J W ^a   Lee, S R ^b   Stein, H J ^b   Picraux, S T ^b   Watanabe, J K ^c   Mayer, J W ^d  

^a Department of Obstetrics Gynecology   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c MOTOROLA INC   (United States)

^d ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000122741     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.360806     Document Type: Article

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