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Volumn 134, Issue 3-4, 1998, Pages 360-364
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Gettering of Cu by He-induced cavities in SIMOX materials
a a a a b c c |
Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
COPPER;
CRYSTAL IMPURITIES;
DIFFUSION IN SOLIDS;
HELIUM;
PURIFICATION;
RADIATION DETECTORS;
SECONDARY ION MASS SPECTROMETRY;
SEMICONDUCTOR DEVICE MANUFACTURE;
SILICON WAFERS;
SUBSTRATES;
TRANSMISSION ELECTRON MICROSCOPY;
BURIED OXIDE (BOX) LAYERS;
SEPARATION BY IMPLANTATION OF OXYGEN (SIMOX);
ION IMPLANTATION;
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EID: 0032025034
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0168-583X(97)00558-2 Document Type: Article |
Times cited : (4)
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References (14)
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