Influence of microwave energy on semiconductors during ion implantation process

Journal of Applied Physics

Volumn 88, Issue 7, 2000, Pages 3968-3975

  Gay, H C ^a   Gibert, P ^b   Lin Kwang, J ^b  

^a UNIVERSITÉ DE TOULOUSE   (France)

^b MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0346976419     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1289218     Document Type: Article

References (22)

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