Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication

Progress in Polymer Science

Volumn 54-55, Issue , 2016, Pages 76-127

  Ji, Shengxiang ^a   Wan, Lei ^b   Liu, Chi Chun ^c   Nealey, Paul F ^d  

^a CHANGCHUN INSTITUTE OF APPLIED CHEMISTRY   (China)

^b WESTERN DIGITAL CORPORATION   (United States)

^c IBM   (United States)

^d UNIVERSITY OF CHICAGO   (United States)

Author keywords

Bit patterned media; Block copolymer lithography; Chemical pattern; Directed self assembly; Nanofabrication; Pattern transfer

Indexed keywords

DIGITAL STORAGE; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; SELF ASSEMBLY;

BIT-PATTERNED MEDIA; BLOCK COPOLYMER LITHOGRAPHY; CHEMICAL PATTERN; DIRECTED SELF-ASSEMBLY; PATTERN TRANSFERS;

BLOCK COPOLYMERS;

EID: 84964067982     PISSN: 00796700     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.progpolymsci.2015.10.006     Document Type: Review

References (214)

1. Anonymous International technology roadmap for semiconductors 2013 (accessed Oct 2015)
2. F.S. Bates, and G.H. Fredrickson Block copolymer thermodynamics - theory and experiment Annu Rev Phys Chem 41 1990 525 557
3. P. Mansky, P. Chaikin, and E.L. Thomas Monolayer films of diblock copolymer microdomains for nanolithographic applications J Mater Sci 30 1995 1987 1992
4. P. Mansky, C.K. Harrison, P.M. Chaikin, R.A. Register, and N. Yao Nanolithographic templates from diblock copolymer thin films Appl Phys Lett 68 1996 2586 2588
5. M. Park, C. Harrison, P.M. Chaikin, R.A. Register, and D.H. Adamson Block copolymer lithography: periodic arrays of similar to 10(1 1) holes in 1 square centimeter Science 276 1997 1401 1404
6. S. Kim, C.M. Bates, A. Thio, J.D. Cushen, C.J. Ellison, C.G. Willson, and F.S. Bates Consequences of surface neutralization in diblock copolymer thin films ACS Nano 7 2013 9905 9919
7. P. Mansky, Y. Liu, E. Huang, T.P. Russell, and C.J. Hawker Controlling polymer-surface interactions with random copolymer brushes Science 275 1997 1458 1460
8. R.D. Peters, X.M. Yang, T.K. Kim, B.H. Sohn, and P.F. Nealey Using self-assembled monolayers exposed to X-rays to control the wetting behavior of thin films of diblock copolymers Langmuir 16 2000 4625 4631
9. D.Y. Ryu, K. Shin, E. Drockenmuller, C.J. Hawker, and T.P. Russell A generalized approach to the modification of solid surfaces Science 308 2005 236 239
10. I. In, Y.H. La, S.M. Park, P.F. Nealey, and P. Gopalan Side-chain-grafted random copolymer brushes as neutral surfaces for controlling the orientation of block copolymer microdomains in thin films Langmuir 22 2006 7855 7860
11. E. Han, I. In, S.M. Park, Y.H. La, Y. Wang, P.F. Nealey, and P. Gopalan Photopatternable imaging layers for controlling block copolymer microdomain orientation Adv Mater 19 2007 4448 4452
12. S. Ji, C.C. Liu, J.G. Son, K. Gotrik, G.S.W. Craig, P. Gopalan, F.J. Himpsel, K. Char, and P.F. Nealey Generalization of the use of random copolymers to control the wetting behavior of block copolymer films Macromolecules 41 2008 9098 9103
13. S.X. Ji, G.L. Liu, F. Zheng, G.S.W. Craig, F.J. Himpsel, and P.F. Nealey Preparation of neutral wetting brushes for block copolymer films from homopolymer blends Adv Mater 20 2008 3054 3060
14. S.X. Ji, W. Liao, and P.F. Nealey Block cooligomers: a generalized approach to controlling the wetting behavior of block copolymer thin films Macromolecules 43 2010 6919 6922
15. C.M. Bates, J.R. Strahan, L.J. Santos, B.K. Mueller, B.O. Bamgbade, J.A. Lee, J.M. Katzenstein, C.J. Ellison, and C.G. Willson Polymeric cross-linked surface treatments for controlling block copolymer orientation in thin films Langmuir 27 2011 2000 2006
16. S.H. Kim, M.J. Misner, and T.P. Russell Solvent-induced ordering in thin film diblock copolymer/homopolymer mixtures Adv Mater 16 2004 2119 2123
17. S.H. Kim, M.J. Misner, T. Xu, M. Kimura, and T.P. Russell Highly oriented and ordered arrays from block copolymers via solvent evaporation Adv Mater 16 2004 226 231
18. T.L. Morkved, M. Lu, A.M. Urbas, E.E. Ehrichs, H.M. Jaeger, P. Mansky, and T.P. Russell Local control of microdomain orientation in diblock copolymer thin films with electric fields Science 273 1996 931 933
19. S. Park, D.H. Lee, J. Xu, B. Kim, S.W. Hong, U. Jeong, T. Xu, and T.P. Russell Macroscopic 10-terabit-per-square-inch arrays from block copolymers with lateral order Science 323 2009 1030 1033
20. S.O. Kim, H.H. Solak, M.P. Stoykovich, N.J. Ferrier, J.J. de Pablo, and P.F. Nealey Epitaxial selfassembly of block copolymers on lithographically defined nanopatterned substrates Nature 424 2003 411 414
21. R.A. Segalman, H. Yokoyama, and E.J. Kramer Graphoepitaxy of spherical domain block copolymer films Adv Mater 13 2001 1152 1155
22. D.E. Angelescu, J.H. Waller, D.H. Adamson, P. Deshpande, S.Y. Chou, R.A. Register, and P.M. Chaikin Macroscopic orientation of block copolymer cylinders in single-layer films by shearing Adv Mater 16 2004 1736 1740
23. C. Park, J.Y. Cheng, M.J. Fasolka, A.M. Mayes, C.A. Ross, E.L. Thomas, and C. De Rosa Double textured cylindrical block copolymer domains via directional solidification on a topographically patterned substrate Appl Phys Lett 79 2001 848 850
24. M.P. Stoykovich, M. Muller, S.O. Kim, H.H. Solak, E.W. Edwards, J.J. de Pablo, and P.F. Nealey Directed assembly of block copolymer blends into nonregular device-oriented structures Science 308 2005 1442 1446
25. E.W. Edwards, M.F. Montague, H.H. Solak, C.J. Hawker, and P.F. Nealey Precise control over molecular dimensions of block-copolymer domains using the interfacial energy of chemically nanopatterned substrates Adv Mater 16 2004 1315 1319
26. C.C. Liu, E. Han, M.S. Onses, C.J. Thode, S.X. Ji, P. Gopalan, and P.F. Nealey Fabrication of lithographically defined chemically patterned polymer brushes and mats Macromolecules 44 2011 1876 1885
27. A.M. Welander, H.M. Kang, K.O. Stuen, H.H. Solak, M. Muller, J.J. de Pablo, and P.F. Nealey Rapid directed assembly of block copolymer films at elevated temperatures Macromolecules 41 2008 2759 2761
28. L. Rockford, Y. Liu, P. Mansky, T.P. Russell, M. Yoon, and S.G.J. Mochrie Polymers on nanoperiodic, heterogeneous surfaces Phys Rev Lett 82 1999 2602 2605
29. X.M. Yang, R.D. Peters, T.K. Kim, and P.F. Nealey Patterning of self-assembled monolayers with lateral dimensions of 0.15 mu m using advanced lithography J Vac Sci Technol B 17 1999 3203 3207
30. X.M. Yang, R.D. Peters, P.F. Nealey, H.H. Solak, and F. Cerrina Guided self-assembly of symmetric diblock copolymer films on chemically nanopatterned substrates Macromolecules 33 2000 9575 9582
31. H. Kang, G.S.W. Craig, E. Han, P. Gopalan, and P.F. Nealey Degree of perfection and pattern uniformity in the directed assembly of cylinder-forming block copolymer on chemically patterned surfaces Macromolecules 45 2012 159 164
32. C.C. Liu, P.F. Nealey, A.K. Raub, P.J. Hakeem, S.R.J. Brueck, E. Han, and P. Gopalan Integration of block copolymer directed assembly with193 immersion lithography J Vac Sci Technol B 28 2010 C6b30-C36b34
33. E.W. Edwards, M.P. Stoykovich, M. Muller, H.H. Solak, J.J. De Pablo, and P.F. Nealey Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates J Polym Sci, B: Polym Phys 43 2005 3444 3459
34. S. Wu Surface and interfacial tensions of polymer melts. 2. Poly(methyl methacrylate) poly(normal-butyl methacrylate), and polystyrene J Phys Chem 74 1970 632 638
35. P. Mansky, T.P. Russell, C.J. Hawker, J. Mays, D.C. Cook, and S.K. Satija Interfacial segregation in disordered block copolymers: effect of tunable surface potentials Phys Rev Lett 79 1997 237 240
36. H. Yokoyama, and E.J. Kramer Self-diffusion of asymmetric diblock copolymers with a spherical domain structure Macromolecules 31 1998 7871 7876
37. S. Park, B. Kim, J. Xu, T. Hofmann, B.M. Ocko, and T.P. Russell Lateral ordering of cylindrical microdomains under solvent vapor Macromolecules 42 2009 1278 1284
38. D. Borah, M.T. Shaw, J.D. Holmes, and M.A. Morris Sub-10 nm feature Size PS-b-PDMS block copolymer structures fabricated by a microwave-assisted solvothermal process ACS Appl Mater Interfaces 5 2013 2004 2012
39. X.J. Zhang, K.D. Harris, N.L.Y. Wu, J.N. Murphy, and J.M. Buriak Fast assembly of ordered block copolymer nanostructures through microwave annealing ACS Nano 4 2010 7021 7029
40. K.W. Gotrik, and C.A. Ross Solvothermal annealing of block copolymer thin films Nano Lett 13 2013 5117 5122
41. W.I. Park, K. Kim, H.I. Jang, J.W. Jeong, J.M. Kim, J. Choi, J.H. Park, and Y.S. Jung Directed self-assembly with sub-100 degrees celsius processing temperature sub-10 nanometer resolution, and sub-1 minute assembly time Small 8 2012 3762 3768
42. J.E. Seppala, R.L. Lewis, and T.H. Epps Spatial and orientation control of cylindrical nanostructures in ABA triblock copolymer thin films by raster solvent vapor annealing ACS Nano 6 2012 9855 9862
43. J.W. Jeong, Y.H. Hur, Kim Hj, J.M. Kim, W.I. Park, M.J. Kim, B.J. Kim, and Y.S. Jung Proximity injection of plasticizing molecules to self-assembling polymers for large-area ultrafast nanopatterning in the sub-10-nm regime ACS Nano 7 2013 6747 6757
44. E.M. Freer, L.E. Krupp, W.D. Hinsberg, P.M. Rice, J.L. Hedrick, J.N. Cha, R.D. Miller, and H.C. Kim Oriented mesoporous organosilicate thin films Nano Lett 5 2005 2014 2018
45. R.M. Ho, W.H. Tseng, H.W. Fan, Y.W. Chiang, C.C. Lin, B.T. Ko, and B.H. Huang Solvent-induced microdomain orientation in polystyrene-b-poly (l-lactide) diblock copolymer thin films for nanopatterning Polymer 46 2005 9362 9377
46. K.V. Peinemann, V. Abetz, and P.F.W. Simon Asymmetric superstructure formed in a block copolymer via phase separation Nat Mater 6 2007 992 996
47. W.A. Phillip, B. O'Neill, M. Rodwogin, M.A. Hillmyer, and E.L. Cussler Self-assembled block copolymer thin films as water filtration membranes ACS Appl Mater Interfaces 2 2010 847 853
48. M. Vayer, M.A. Hillmyer, M. Dirany, G. Thevenin, R. Erre, and C. Sinturel Perpendicular orientation of cylindrical domains upon solvent annealing thin films of polystyrene-bpolylactide Thin Solid Films 518 2010 3710 3715
49. J. Yin, X.P. Yao, J.Y. Liou, W. Sun, Y.S. Sun, and Y. Wang Membranes with highly ordered straight nanopores by selective swelling of fast perpendicularly aligned block copolymers ACS Nano 7 2013 9961 9974
50. T. Hirai, M. Leolukman, C.C. Liu, E. Han, Y.J. Kim, Y. Ishida, T. Hayakawa, M. Kakimoto, P.F. Nealey, and P. Gopalan One-step direct-patterning template utilizing self-assembly of POSS-containing block copolymers Adv Mater 21 2009 4334 4338
51. E. Kim, H. Ahn, S. Park, H. Lee, M. Lee, S. Lee, T. Kim, E.A. Kwak, J.H. Lee, X. Lei, J. Huh, J. Bang, B. Lee, and D.Y. Ryu Directed assembly of high molecular weight block copolymers: highly ordered line patterns of perpendicularly oriented lamellae with large periods ACS Nano 7 2013 1952 1960
52. G. Kim, and M. Libera Morphological development in solvent-cast polystyrenepolybutadiene-polystyrene (SBS) triblock copolymer thin films Macromolecules 31 1998 2569 2577
53. S. Ludwigs, A. Boker, A. Voronov, N. Rehse, R. Magerle, and G. Krausch Self-assembly of functional nanostructures from ABC triblock copolymers Nat Mater 2 2003 744 747
54. J.K. Bosworth, M.Y. Paik, R. Ruiz, E.L. Schwartz, J.Q. Huang, A.W. Ko, D.M. Smilgies, C.T. Black, and C.K. Ober Control of self-assembly of lithographically patternable block copolymer films ACS Nano 2 2008 1396 1402
55. Y.S. Jung, and C.A. Ross Solvent-vapor-induced tunability of self-assembled block copolymer patterns Adv Mater 21 2009 2540 2545
56. Y. Xuan, J. Peng, L. Cui, H.F. Wang, B.Y. Li, and Y.C. Han Morphology development of ultrathin symmetric diblock copolymer film via solvent vapor treatment Macromolecules 37 2004 7301 7307
57. J. Peng, Y. Xuan, H.F. Wang, Y.M. Yang, B.Y. Li, and Y.C. Han Solvent-induced microphase separation in diblock copolymer thin films with reversibly switchable morphology J Chem Phys 120 2004 11163 11170
58. Y. Wang, X. Hong, B. Liu, C. Ma, and C. Zhang Two-dimensional ordering in block copolymer monolayer thin films upon selective solvent annealing Macromolecules 41 2008 5799 5808
59. K. Fukunaga, H. Elbs, R. Magerle, and G. Krausch Large-scale alignment of ABC block copolymer microdomains via solvent vapor treatment Macromolecules 33 2000 947 953
60. H. Huang, F. Zhang, Z. Hu, B. Du, T. He, F.K. Lee, Y. Wang, and O.K.C. Tsui Study on the origin of inverted phase in drying solution-cast block copolymer films Macromolecules 36 2003 4084 4092
61. M. Banaszak, and M.D. Whitmore Self-consistent theory of block copolymer blends: selective solvent Macromolecules 25 1992 3406 3412
62. K.J. Hanley, T.P. Lodge, and C.I. Huang Phase behavior of a block copolymer in solvents of varying selectivity Macromolecules 33 2000 5918 5931
63. M.D. Whitmore, and J.D. Vavasour Self-consistent mean field theory of the microphase diagram of block copolymer/neutral solvent blends Macromolecules 25 1992 2041 2045
64. C.I. Huang, and T.P. Lodge Self-consistent calculations of block copolymer solution phase behavior Macromolecules 31 1998 3556 3565
65. T.P. Lodge, K.J. Hanley, B. Pudil, and V. Alahapperuma Phase behavior of block copolymers in a neutral solvent Macromolecules 36 2003 816 822
66. T.P. Lodge, C. Pan, X. Jin, Z. Liu, J. Zhao, W.W. Maurer, and F.S. Bates Failure of the dilution approximation in block copolymer solutions J Polym Sci, B: Polym Phys 33 1995 2289 2293
67. K. Mori, H. Hasegawa, and T. Hashimoto Order-disorder transition of polystyrene-blockpolyisoprene. Part II. Characteristic length as a function of polymer concentration, molecular weight, copolymer composition, and chi parameter Polymer 42 2001 3009 3021
68. M.J. Fasolka, and A.M. Mayes Block copolymer thin films: physics and applications Annu Rev Mater Res 31 2001 323 355
69. A. Knoll, A. Horvat, K.S. Lyakhova, G. Krausch, G.J.A. Sevink, A.V. Zvelindovsky, and R. Magerle Phase behavior in thin films of cylinder-forming block copolymers Phys Rev Lett 89 2002 035501/1-035501/4
70. M.Y. Paik, J.K. Bosworth, D.M. Smilges, E.L. Schwartz, X. Andre, and C.K. Ober Reversible morphology control in block copolymer films via solvent vapor processing: an in situ GISAXS study Macromolecules 43 2010 4253 4260
71. J.Q. Zhang, D. Posselt, D.M. Smilgies, J. Perlich, K. Kyriakos, S. Jaksch, and C.M. Papadakis Lamellar diblock copolymer thin films during solvent vapor annealing studied by GISAXS: different behavior of parallel and perpendicular lamellae Macromolecules 47 2014 5711 5718
72. M.J. Heinzer, S. Han, J.A. Pople, D.G. Baird, and S.M. Martin In situ tracking of microstructure spacing and ordered domain compression during the drying of solution-cast block copolymer films using small-angle X-ray scattering Macromolecules 45 2012 3480 3486
73. M.J. Heinzer, S. Han, J.A. Pople, D.G. Baird, and S.M. Martin In situ measurement of block copolymer ordering kinetics during the drying of solution-cast films using small-angle X-ray scattering Macromolecules 45 2012 3471 3479
74. J.Y. Cheng, A.M. Mayes, and C.A. Ross Nanostructure engineering by templated self-assembly of block copolymers Nat Mater 3 2004 823 828
75. J.Y. Cheng, C.A. Ross, E.L. Thomas, H.I. Smith, and G.J. Vancso Fabrication of nanostructures with long-range order using block copolymer lithography Appl Phys Lett 81 2002 3657 3659
76. S.G. Xiao, X.M. Yang, E.W. Edwards, Y.H. La, and P.F. Nealey Graphoepitaxy of cylinderforming block copolymers for use as templates to pattern magnetic metal dot arrays Nanotechnology 16 2005 S324 S329
77. J.G. Son, J. Gwyther, J.B. Chang, K.K. Berggren, I. Manners, and C.A. Ross Highly ordered square arrays from a templated ABC triblock terpolymer Nano Lett 11 2011 2849 2855
78. J.G. Son, K.W. Gotrik, and C.A. Ross High-aspect-ratio perpendicular orientation of PS-b-PDMS Thin films under solvent annealing ACS Macro Lett 1 2012 1279 1284
79. J.K.W. Yang, Y.S. Jung, J.B. Chang, R.A. Mickiewicz, A. Alexander-Katz, C.A. Ross, and K.K. Berggren Complex self-assembled patterns using sparse commensurate templates with locally varying motifs Nat Nanotechnol 5 2010 256 260
80. K.G.A. Tavakkoli, K.W. Gotrik, A.F. Hannon, A. Alexander-Katz, C.A. Ross, and K.K. Berggren Templating three-dimensional self-assembled structures in bilayer block copolymer films Science 336 2012 1294 1298
81. J.D. Cushen, L. Wan, G. Pandav, I. Mitra, G.E. Stein, V. Ganesan, R. Ruiz, C. Grant Willson, and C.J. Ellison Ordering poly(trimethylsilyl styrene-block-d,l-lactide) block copolymers in thin films by solvent annealing using a mixture of domain-selective solvents J Polym Sci, B: Polym Phys 52 2014 36 45
82. J.K. Bosworth, E. Dobisz, and R. Ruiz 20 nm pitch directed block copolymer assembly using solvent annealing for bit patterned media J Photopolym Sci Technol 23 2010 145 148
83. Y. Tada, H. Yoshida, Y. Ishida, T. Hirai, J.K. Bosworth, E. Dobisz, R. Ruiz, M. Takenaka, T. Hayakawa, and H. Hasegawa Directed self-assembly of poss containing block copolymer on lithographically defined chemical template with morphology control by solvent vapor Macromolecules 45 2012 292 304
84. -2 Adv Mater 23 2012 5755 5761
85. E.W. Edwards, M. Muller, M.P. Stoykovich, H.H. Solak, J.J. de Pablo, and P.F. Nealey Dimensions and shapes of block copolymer domains assembled on lithographically defined chemically patterned substrates Macromolecules 40 2007 90 96
86. A.M. Welander, G.S.W. Craig, Y. Tada, H. Yoshida, and P.F. Nealey Directed assembly of block copolymers in thin to thick films Macromolecules 46 2013 3915 3921
87. S.X. Ji, C.C. Liu, W. Liao, A.L. Fenske, G.S.W. Craig, and P.F. Nealey Domain orientation and grain coarsening in cylinder-forming poly(styrene-b-methyl methacrylate) films Macromolecules 44 2011 4291 4300
88. X.S. Jin, X.S. Zhang, L. Wan, P.F. Nealey, and S.X. Ji Fabrication of chemical patterns from graphoepitaxially assembled block copolymer films by molecular transfer printing Polymer 55 2014 3278 3283
89. E. Han, K.O. Stuen, Y.H. La, P.F. Nealey, and P. Gopalan Effect of composition of substrate-modifying random copolymers on the orientation of symmetric and asymmetric diblock copolymer domains Macromolecules 41 2008 9090 9097
90. E.W. Edwards, M.P. Stoykovich, H.H. Solak, and P.F. Nealey Long-range order and orientation of cylinder-forming block copolymers on chemically nanopatterned striped surfaces Macromolecules 39 2006 3598 3607
91. Q. Wang, P.F. Nealey, and J.J. de Pablo Simulations of the morphology of cylinder-forming asymmetric diblock copolymer thin films on nanopatterned substrates Macromolecules 36 2003 1731 1740
92. S.M. Park, G.S.W. Craig, C.C. Liu, Y.H. La, N.J. Ferrier, and P.F. Nealey Characterization of cylinder-forming block copolymers directed to assemble on spotted chemical patterns Macromolecules 41 2008 9118 9123
93. R. Ruiz, H.M. Kang, F.A. Detcheverry, E. Dobisz, D.S. Kercher, T.R. Albrecht, J.J. de Pablo, and P.F. Nealey Density multiplication and improved lithography by directed block copolymer assembly Science 321 2008 936 939
94. Y. Tada, S. Akasaka, H. Yoshida, H. Hasegawa, E. Dobisz, D. Kercher, and M. Takenaka Directed self-assembly of diblock copolymer thin films on chemically-patterned substrates for defect-free nano-patterning Macromolecules 41 2008 9267 9276
95. L. Wan, and X.M. Yang Directed self-assembly of cylinder-forming block copolymers: prepatterning effect on pattern quality and density multiplication factor Langmuir 25 2009 12408 12413
96. X.M. Yang, L. Wan, S.G. Xiao, Y.A. Xu, and D.K. Weller Directed block copolymer assembly versus electron beam lithography for bit-patterned media with areal density of 1 terabit/inch(2) and beyond ACS Nano 3 2009 1844 1858
97. F.S. Bates, R.E. Cohen, and C.V. Berney Small-angle neutron-scattering determination of macro-lattice structure in a polystyrene polybutadiene diblock co-polymer Macromolecules 15 1982 589 592
98. E.L. Thomas, D.J. Kinning, D.B. Alward, and C.S. Henkee Ordered packing arrangements of spherical micelles of diblock copolymers in 2 and 3 dimensions Macromolecules 20 1987 2934 2939
99. I. Bita, J.K.W. Yang, Y.S. Jung, C.A. Ross, E.L. Thomas, and K.K. Berggren Graphoepitaxy of selfassembled block copolymers on two-dimensional periodic patterned templates Science 321 2008 939 943
100. G.E. Stein, E.J. Kramer, X.F. Li, and J. Wang Layering transitions in thin films of sphericaldomain block copolymers Macromolecules 40 2007 2453 2460
101. S.M. Park, G.S.W. Craig, Y.H. La, and P.F. Nealey Morphological reconstruction and ordering in films of sphere-forming block copolymers on striped chemically patterned surfaces Macromolecules 41 2008 9124 9129
102. V.P. Chuang, J. Gwyther, R.A. Mickiewicz, I. Manners, and C.A. Ross Templated self-assembly of square symmetry arrays from an ABC triblock terpolymer Nano Lett 9 2009 4364 4369
103. C.B. Tang, J. Bang, G.E. Stein, G.H. Fredrickson, C.J. Hawker, E.J. Kramer, M. Sprung, and J. Wang Square packing and structural arrangement of ABC triblock copolymer spheres in thin films Macromolecules 41 2008 4328 4339
104. S.X. Ji, U. Nagpal, W. Liao, C.C. Liu, J.J. de Pablo, and P.F. Nealey Three-dimensional directed assembly of block copolymers together with two-dimensional square and rectangular nanolithography Adv Mater 23 2011 3692 3697
105. S.M. Park, G.S.W. Craig, Y.H. La, H.H. Solak, and P.F. Nealey Square arrays of vertical cylinders of PS-b-PMMA on chemically nanopatterned surfaces Macromolecules 40 2007 5084 5094
106. H. Kang, G.S.W. Craig, and P.F. Nealey Directed assembly of asymmetric ternary block copolymer-homopolymer blends using symmetric block copolymer into checkerboard trimming chemical pattern J Vac Sci Technol B 26 2008 2495 2499
107. M.P. Stoykovich, H. Kang, K.C. Daoulas, G. Liu, C.C. Liu, J.J. de Pablo, M. Mueller, and P.F. Nealey Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries ACS Nano 1 2007 168 175
108. G.M. Wilmes, D.A. Durkee, N.P. Balsara, and J.A. Liddle Bending soft block copolymer nanostructures by lithographically directed assembly Macromolecules 39 2006 2435 2437
109. H. Yi, X.Y. Bao, J. Zhang, C. Bencher, L.W. Chang, X.Y. Chen, R. Tiberio, J. Conway, H.X. Dai, Y.M. Chen, S. Mitra, and H.S.P. Wong Flexible control of block copolymer directed self-assembly using small topographical templates: potential lithography solution for integrated circuit contact hole patterning Adv Mater 24 2012 3107 3114
110. K.C. Daoulas, M. Muller, M.P. Stoykovich, S.M. Park, Y.J. Papakonstantopoulos, J.J. de Pablo, P.F. Nealey, and H.H. Solak Fabrication of complex three-dimensional nanostructures from self110 assembling block copolymer materials on two-dimensional chemically patterned templates with mismatched symmetry Phys Rev Lett 96 2006 036104/1-036104/4
111. G.L. Liu, F. Detcheverry, A. Ramirez-Hernandez, H. Yoshida, Y. Tada, J.J. de Pablo, and P.F. Nealey Nonbulk complex structures in thin films of symmetric block copolymers on chemically nanopatterned surfaces Macromolecules 45 2012 3986 3992
112. H. Jung, D. Hwang, E. Kim, B.J. Kim, W.B. Lee, J.E. Poelma, J. Kim, C.J. Hawker, J. Huh, D.Y. Ryu, and J. Bang Three-dimensional multilayered nanostructures with controlled orientation of microdomains from cross-linkable block copolymers ACS Nano 5 2011 6164 6173
113. G.L. Liu, A. Ramirez-Hernandez, H. Yoshida, K. Nygard, D.K. Satapathy, O. Bunk, J.J. de Pablo, and P.F. Nealey Morphology of lamellae-forming block copolymer films between two orthogonal chemically nanopatterned striped surfaces Phys Rev Lett 108 2012 065502/1-065502/5
114. M.D. Gehlsen, K. Almdal, and F.S. Bates Order-disorder transition - diblock versus triblock copolymers Macromolecules 25 1992 939 943
115. S.M. Mai, W. Mingvanish, S.C. Turner, C. Chaibundit, J.P.A. Fairclough, F. Heatley, M.W. Matsen, A.J. Ryan, and C. Booth Microphase-separation behavior of triblock copolymer melts, comparison with diblock copolymer melts Macromolecules 33 2000 5124 5130
116. M.W. Matsen Bridging and looping in multiblock copolymer melts J Chem Phys 102 1995 3884 3887
117. M.W. Matsen, and M. Schick Lamellar phase of a symmetrical triblock copolymer Macromolecules 27 1994 187 192
118. H. Watanabe Slow dielectric-relaxation of a styrene-isoprene-styrene triblock copolymer with dipole inversion in the middle block - a challenge to a loop-bridge problem Macromolecules 28 1995 5006 5011
119. S.X. Ji, U. Nagpal, G.L. Liu, S.P. Delcambre, M. Muller, J.J. de Pablo, and P.F. Nealey Directed assembly of non-equilibrium ABA triblock copolymer morphologies on nanopatterned substrates ACS Nano 6 2012 5440 5448
120. S.P. Delcambre, S.X. Ji, and P.F. Nealey Mechanical properties of polymeric nanostructures fabricated through directed self-assembly of symmetric diblock and triblock copolymers J Vac Sci Technol B 30 2012 06F204/1-06F204/9
121. T. Tanaka, M. Morigami, and N. Atoda Mechanism of resist pattern collapse J Electrochem Soc 140 1993 L115 L116
122. S.X. Ji, C.C. Liu, G.L. Liu, and P.F. Nealey Molecular transfer printing using block copolymers ACS Nano 4 2010 599 609
123. J.L. Wilbur, A. Kumar, E. Kim, and G.M. Whitesides Microfabrication by microcontact printing of self-assembled monolayers Adv Mater 6 1994 600 604
124. C.J. Thode, P.L. Cook, Y.M. Jiang, M.S. Onses, S.X. Ji, F.J. Himpsel, and P.F. Nealey In situ metallization of patterned polymer brushes created by molecular transfer print and fill Nanotechnology 24 2013 155602/1-155602/8
125. M.S. Onses, C.J. Thode, C.C. Liu, S.X. Ji, P.L. Cook, F.J. Himpsel, and P.F. Nealey Site-specific placement of Au nanoparticles on chemical nanopatterns prepared by molecular transfer printing using block-copolymer films Adv Funct Mater 21 2011 3074 3082
126. J.Y. Cheng, C.T. Rettner, D.P. Sanders, H.C. Kim, and W.D. Hinsberg Dense self-assembly on sparse chemical patterns: rectifying and multiplying lithographic patterns using block copolymers Adv Mater 20 2008 3155 3158
127. G.L. Liu, C.S. Thomas, G.S.W. Craig, and P.F. Nealey Integration of density multiplication in the formation of device-oriented structures by directed assembly of block copolymer-homopolymer blends Adv Funct Mater 20 2010 1251 1257
128. C.C. Liu, A. Ramirez-Hernandez, E. Han, G.S.W. Craig, Y. Tada, H. Yoshida, H.M. Kang, S.X. Ji, P. Gopalan, J.J. de Pablo, and P.F. Nealey Chemical patterns for directed self-assembly of 111 lamellae-forming block copolymers with density multiplication of features Macromolecules 46 2013 1415 1424
129. T. Thurn-Albrecht, J. Schotter, G. Kästle, N. Emley, T. Shibauchi, L. Krusin-Elbaum, K. Guarini, C. Black, M. Tuominen, and T. Russell Ultrahigh-density nanowire arrays grown in self-assembled diblock copolymer templates Science 290 2000 2126 2129
130. C.T. Black, R. Ruiz, G. Breyta, J.Y. Cheng, M.E. Colburn, K.W. Guarini, H.C. Kim, and Y. Zhang Polymer self assembly in semiconductor microelectronics IBM J Res Develop 51 2007 605 633
131. K.W. Guarini, C.T. Black, Y. Zhang, I.V. Babich, E.M. Sikorski, and L.M. Gignac Low voltage, scalable nanocrystal flash memory fabricated by templated self assembly Proc Int Electron Devices Meeting 2003 2003 541 544
132. A.J. Hong, C.C. Liu, Y. Wang, J. Kim, F.X. Xiu, S.X. Ji, J. Zou, P.F. Nealey, and K.L. Wang Metal nanodot memory by self-assembled block copolymer lift-off Nano Lett 10 2010 224 229
133. T.F. Kuech, and L.J. Mawst Nanofabrication of III-V semiconductors employing diblock copolymer lithography J Phys D 43 2010 183001/1-183001/18
134. O. Hellwig, J.K. Bosworth, E. Dobisz, D. Kercher, T. Hauet, G. Zeltzer, J.D. Risner-Jamtgaard, D. Yaney, and R. Ruiz Bit patterned media based on block copolymer directed assembly with narrow magnetic switching field distribution Appl Phys Lett 96 2010 052511/1-052511/3
135. M. Muramatsu, M. Iwashita, T. Kitano, T. Toshima, M. Somervell, Y. Seino, D. Kawamura, M. Kanno, K. Kobayashi, and T. Azuma Nanopatterning of diblock copolymer directed selfassembly lithography with wet development J Micro Nanolithogr MEMS MOEMS 11 2012 031305/1-031305/6
136. Y. Seino, H. Yonemitsu, H. Sato, M. Kanno, H. Kato, K. Kobayashi, A. Kawanishi, T. Azuma, M. Muramatsu, and S. Nagahara Contact hole shrink process using graphoepitaxial directed self-assembly lithography J Micro Nanolithogr MEMS MOEMS 12 2013 033011/1-033011/6
137. R. Gronheid, J. Bekaert, V.-K. Murugesan Kuppuswamy, N. Vandenbroeck, J. Doise, Y. Cao, G. Lin, S. Sayan, D. Parnell, and M. Somervell Process optimization of templated DSA flows Proc SPIE 9051 2014 90510I/1-90510I/17
138. R. Harukawa, M. Aoki, A. Cross, V. Nagaswami, T. Tomita, S. Nagahara, M. Muramatsu, S. Kawakami, H. Kosugi, and B. Rathsack DSA hole defectivity analysis using advanced optical inspection tool Proc SPIE 8681 2013 86811A/1-86811A/17
139. M. Somervell, T. Yamauchi, S. Okada, T. Tomita, T. Nishi, E. Iijima, T. Nakano, T. Ishiguro, S. Nagahara, and H. Iwaki High-volume manufacturing equipment and processing for directed self-assembly applications Proc SPIE 9051 2014 90510N/1-90510N/11
140. S.M. Park, M.P. Stoykovich, R. Ruiz, Y. Zhang, C.T. Black, and P.E. Nealey Directed assembly of lamellae-forming block copolymers by using chemically and topographically patterned substrates Adv Mater 19 2007 607 611
141. C.C. Liu, P.F. Nealey, Y.H. Ting, and A.E. Wendt Pattern transfer using poly(styrene-blockmethyl methacrylate) copolymer films and reactive ion etching J Vac Sci Technol B 25 2007 1963 1968
142. H. Gokan, S. Esho, and Y. Ohnishi Dry etch resistance of organic materials J Electrochem Soc 130 1983 143 146
143. Y.H. Ting, S.M. Park, C.C. Liu, X.S. Liu, F.J. Himpsel, P.F. Nealey, and A.E. Wendt Plasma etch removal of poly(methyl methacrylate) in block copolymer lithography J Vac Sci Technol B 26 2008 1684 1689
144. F. Yamashita, E. Nishimura, K. Yatsuda, H. Mochiki, and J. Bannister Exploration of suitable dry etch technologies for directed self-assembly Proc SPIE 83280T 2012 83280T/1-83280T/9
145. B.T. Chan, S. Tahara, D. Parnell, P.A. Rincon Delgadillo, R. Gronheid, J.F. de Marneffe, K. Xu, E. Nishimura, and W. Boullart 28 nm pitch of line/space pattern transfer into silicon substrates with chemo-epitaxy Directed Self-Assembly (DSA) process flow Microelectron Eng 123 2014 180 186
146. Y.H. La, M.P. Stoykovich, S.M. Park, and P.F. Nealey Directed assembly of cylinder-forming block copolymers into patterned structures to fabricate arrays of spherical domains and nanoparticles Chem Mater 19 2007 4538 4544
147. S.A. Morin, Y.H. La, C.C. Liu, J.A. Streifer, R.J. Hamers, P.F. Nealey, and S. Jin Assembly of nanocrystal arrays by block-copolymer-directed nucleation Angew Chem Int Ed 48 2009 2135 2139
148. J.Y. Cheng, C.A. Ross, V.Z.H. Chan, E.L. Thomas, R.G.H. Lammertink, and G.J. Vancso Formation of a cobalt magnetic dot array via block copolymer lithography Adv Mater 13 2001 1174 1178
149. Y.S. Jung, W. Jung, H.L. Tuller, and C.A. Ross Nanowire conductive polymer gas sensor patterned using self-assembled block copolymer lithography Nano Lett 8 2008 3776 3780
150. Y.S. Jung, and C.A. Ross Orientation-controlled self-assembled nanolithography using a polystyrene-polydimethylsiloxane block copolymer Nano Lett 7 2007 2046 2050
151. S.G. Xiao, X.M. Yang, S.J. Park, D. Weller, and T.P. Russell A novel approach to addressable 4 teradot/in. (2) patterned media Adv Mater 21 2009 2516 2519
152. C.M. Bates, T. Seshimo, M.J. Maher, W.J. Durand, J.D. Cushen, L.M. Dean, G. Blachut, C.J. Ellison, and C.G. Willson Polarity-switching top coats enable orientation of sub-10-nm block copolymer domains Science 338 2012 775 779
153. M.J. Maher, C.M. Bates, G. Blachut, S. Sirard, J.L. Self, M.C. Carlson, L.M. Dean, J.D. Cushen, W.J. Durand, C.O. Hayes, C.J. Ellison, and C.G. Willson Interfacial design for block copolymer thin films Chem Mater 26 2014 1471 1479
154. M.J. Maher, C.T. Rettner, C.M. Bates, G. Blachut, M.C. Carlson, W.J. Durand, C.J. Ellison, D.P. Sanders, J.Y. Cheng, and C.G. Willson Directed self-assembly of silicon-containing block copolymer thin films ACS Appl Mater Interfaces 7 2015 3323 3328
155. Q. Peng, Y.C. Tseng, S.B. Darling, and J.W. Elam Nanoscopic patterned materials with tunable dimensions via atomic layer deposition on block copolymers Adv Mater 22 2010 5129 5133
156. Q. Peng, Y.C. Tseng, S.B. Darling, and J.W. Elam A route to nanoscopic materials via sequential infiltration synthesis on block copolymer templates ACS Nano 5 2011 4600 4606
157. R. Ruiz, L. Wan, J. Lille, K.C. Patel, E. Dobisz, D.E. Johnston, K. Kisslinger, and C.T. Black Image quality and pattern transfer in directed self assembly with block-selective atomic layer deposition J Vac Sci Technol B 30 2012 06F202/1-06F202/6
158. M. Biswas, J.A. Libera, S.B. Darling, and J.W. Elam New insight into the mechanism of sequential infiltration synthesis from infrared spectroscopy Chem Mater 26 2014 6135 6141
159. Y.C. Tseng, Q. Peng, L.E. Ocola, J.W. Elam, and S.B. Darling Enhanced block copolymer lithography using sequential infiltration synthesis J Phys Chem C 115 2011 17725 17729
160. K.W. Guarini, C.T. Black, K.R. Milkove, and R.L. Sandstrom Nanoscale patterning using selfassembled polymers for semiconductor applications J Vac Sci Technol B 19 2001 2784 2788
161. L. Wan, R. Ruiz, H. Gao, K.C. Patel, J. Lille, G. Zeltzer, E.A. Dobisz, A. Bogdanov, P.F. Nealey, and T.R. Albrecht Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography J Micro Nanolithogr MEMS MOEMS 11 2012 031405/1-031405/5
162. S. Xiao, X. Yang, K.Y. Lee, R.J.M. ver der Veerdonk, D. Kuo, and T.P. Russell Aligned nanowires and nanodots by directed block copolymer assembly Nanotechnology 22 2011 305302/1-305302/8
163. G.E. Bailey, A. Tritchkov, J.W. Park, L. Hong, V. Wiaux, E. Hendrickx, S. Verhaegen, P. Xie, and J. Versluijs Double pattern EDA solutions for 32 nm HP and beyond Proc SPIE 6521 2007 65211K/1-65211K/12
164. J. Rubinstein, and A.R. Neureuther Post-decomposition assessment of double patterning layouts Proc SPIE 6924 2008 69240O/1-69240O/12
165. L. Wan, R. Ruiz, H. Gao, K.C. Patel, T.R. Albrecht, Y. Cao, J. Yin, S. Hong, and G. Lin The limits of lamellae-forming PS-b-PMMA block copolymers for lithography ACS Nano 9 2015 7505 7514
166. T.R. Albrecht, H. Arora, V. Ayanoor-Vitikkate, J.M. Beaujour, D. Bedau, D. Berman, A.L. Bogdanov, Y.A. Chapuis, J. Cushen, E.E. Dobisz, G. Doerk, H. Gao, M. Grobis, B. Gurney, W. Hanson, O. Hellwig, T. Hirano, P.O. Jubert, D. Kercher, J. Lille, Z. Liu, C.M. Mate, I. Oboukhov, K.C. Patel, K. Rubin, R. Ruiz, M. Schabes, L. Wan, D. Weller, T.W. Wu, and E. Yang Bit patterned magnetic recording: theory media fabrication, and recording performance IEEE Trans Magn 51 2015 1 44
167. K.C. Patel, R. Ruiz, J. Lille, L. Wan, E.A. Dobisz, H. Gao, T.R. Albrecht, and N. Robertson Line frequency doubling of directed self-assembly patterns for single-digit bit pattern media lithography Proc SPIE 8323 2012 83230U/1-83230U/9
168. G.S. Doerk, H. Gao, L. Wan, J. Lille, K.C. Patel, Y.A. Chapuis, R. Ruiz, and T.R. Albrecht Transfer of self-aligned spacer patterns for single-digit nanofabrication Nanotechnology 26 2015 085304/1-085304/9
169. H.S. Moon, J.Y. Kim, H.M. Jin, W.J. Lee, H.J. Choi, J.H. Mun, Y.J. Choi, S.K. Cha, S.H. Kwon, and S.O. Kim Atomic layer deposition assisted pattern multiplication of block copolymer lithography for 5 nm scale nanopatterning Adv Funct Mater 24 2014 4343 4348
170. H. Hasegawa, T. Hashimoto, H. Kawai, T.P. Lodge, E.J. Amis, C.J. Glinka, and C.C. Han SANS and SAXS studies on molecular-conformation of a block copolymer in microdomain space Macromolecules 18 1985 67 78
171. T. Hashimoto, K. Nagatosh, A. Todo, H. Hasegawa, and H. Kawai Domain-boundary structure of styrene-iosprene block copolymer films cast from toluene solutions Macromolecules 7 1974 364 373
172. T. Hashimoto, A. Todo, H. Itoi, and H. Kawai Domain-boundary structure of styrene-iosprene block copolymer films cast from toluene solutions. 2. Quantitative estimation of interfacial thickness of lamellar microphase systems Macromolecules 10 1977 377 384
173. J.Y. Cheng, C. Ross, E.L. Thomas, H.I. Smith, and G.J. Vancso Templated self-assembly of block copolymers: effect of substrate topography Adv Mater 15 2003 1599 1602
174. F.A. Detcheverry, G.L. Liu, P.F. Nealey, and J.J. de Pablo Interpolation in the directed assembly of block copolymers on nanopatterned substrates: simulation and experiments Macromolecules 43 2010 3446 3454
175. C. Harrison, D.H. Adamson, Z.D. Cheng, J.M. Sebastian, S. Sethuraman, D.A. Huse, R.A. Register, and P.M. Chaikin Mechanisms of ordering in striped patterns Science 290 2000 1558 1560
176. C.T. Black, and O. Bezencenet Nanometer-scale pattern registration and alignment by directed diblock copolymer self-assembly IEEE Trans Nanotechnol 3 2004 412 415
177. T. Kato, A. Sugiyama, K. Ueda, H. Yoshida, S. Miyazaki, T. Tsutsumi, J. Kim, Y. Cao, and G. Lin Advanced CD-SEM metrology for pattern roughness and local placement of lamellar DSA Proc SPIE 9050 2014 1 11 90501T/1-90501T/11
178. C. Harrison, Z.D. Cheng, S. Sethuraman, D.A. Huse, P.M. Chaikin, D.A. Vega, J.M. Sebastian, R.A. Register, and D.H. Adamson Dynamics of pattern coarsening in a two-dimensional smectic system Phys Rev E: Stat Nonlinear Soft Matter Phys 66 2002 011706/1-011706/27
179. C.C. Liu, G.S.W. Craig, H.M. Kang, R. Ruiz, P.F. Nealey, and N.J. Ferrier Practical implementation of order parameter calculation for directed assembly of block copolymer thin films J Polym Sci, B: Polym Phys 48 2010 2589 2603
180. G.S. Doerk, C.C. Liu, J.Y. Cheng, C.T. Rettner, J.W. Pitera, L.E. Krupp, T. Topuria, N. Arellano, and D.P. Sanders Pattern placement accuracy in block copolymer directed self-assembly based on chemical epitaxy ACS Nano 7 2013 276 285
181. S. Yamaguchi, K. Ueda, T. Kato, N. Hasegawa, T. Yamauchi, S. Kawakami, M. Muramatsu, S. Nagahara, and T. Kitano New robust edge detection methodology for qualifying DSA characteristics by using CD SEM Proc SPIE 9050 2014 905029/1-905029/9
182. C. Bencher, J. Smith, L. Miao, C. Cai, Y. Chen, J.Y. Cheng, D.P. Sanders, M. Tjio, H.D. Truong, S. Holmes, and W.D. Hinsberg Self-assembly patterning for sub-15 nm half-pitch: a transition from lab to fab Proc SPIE 7970 2011 79700F/1-79700F/9
183. C. Bencher, H. Yi, J. Zhou, M. Cai, J. Smith, L. Miao, O. Montal, S. Blitshtein, A. Lavi, K. Dotan, H. Dai, J.Y. Cheng, D.P. Sanders, M. Tjio, and S. Holmes Directed self-assembly defectivity assessment. Part II Proc SPIE 8323 2012 83230N/1-83230N/13
184. P.R. Delgadillo, R. Harukawa, M. Suri, S. Durant, A. Cross, V.R. Nagaswami, D. Van Den Heuvel, R. Gronheid, and P. Nealey Defect source analysis of directed self-assembly process (DSA of DSA) Proc SPIE 8680 2013 86800L/1-86800L/9
185. R. Gronheid, P.R. Delgadillo, H. Pathangi, D. Van den Heuvel, D. Parnell, B.T. Chan, Y.T. Lee, L. Van Look, Y. Cao, and Y. Her Defect reduction and defect stability in IMEC's 14 nm halfpitch chemo-epitaxy DSA flow Proc SPIE 9049 2014 904905/1-904905/10
186. T. Yamashita, V. Basker, T. Standaert, C.C. Yeh, J. Faltermeier, T. Yamamoto, Lin CHh, A. Bryant, K. Maitra, P. Kulkarni, S. Kanakasabapathy, H. Sunamura, J. Wang, H. Jagannathan, A. Inada, J. Cho, R. Miller, B. Doris, V. Paruchuri, H. Bu, M. Khare, J. O'Neill, and E. Leobandung Opportunities and challenges of FinFET as a device structure candidate for 14 nm node CMOS technology ECS Trans 34 2011 81 86
187. C.C. Liu, C. Estrada-Raygoza, H. He, M. Cicoria, V. Rastogi, N. Mohanty, H. Tsai, A. Schepis, K. Lai, R. Chao, D. Liu, M. Guillorn, J. Cantone, S. Mignot, R.H. Kim, J. Cheng, M. Tjio, A. Ko, D. Hetzer, M. Somervell, and M. Colburn Towards electrical testable SOI devices using directed self-assembly for fin formation Proc SPIE 9049 2014 904909/1-904909/12
188. S. Sayan, B.T. Chan, R. Gronheid, F. Van Roey, M.S. Kim, L. Williamson, and P. Nealey Directed self-assembly process integration: fin patterning approaches and challenges Proc SPIE 9051 2014 90510M/1-90510M/19
189. D. Weller, and A. Moser Thermal effect limits in ultrahigh-density magnetic recording IEEE Trans Magn 35 1999 4423 4439
190. D.A. Thompson, and J.S. Best The future of magnetic data storage technology IBM J Res Develop 44 2000 311 322
191. M.H. Kryder, E.C. Gage, T.W. McDaniel, W.A. Challener, R.E. Rottmayer, G. Ju, Y.T. Hsia, and M.F. Erden Heat assisted magnetic recording Proc IEEE 96 2008 1810 1835
192. J.G. Zhu, X.C. Zhu, and Y.H. Tang Microwave assisted magnetic recording IEEE Trans Magn 44 2008 125 131
193. S.Y. Chou, M.S. Wei, P.R. Krauss, and P.B. Fischer Single-domain magnetic pillar array of 35 nm diameter and 65 Gbits/in.2 density for ultrahigh density quantum magnetic storage J Appl Phys 76 1994 6673 6675
194. R.M.H. New, R.F.W. Pease, and R.L. White Submicron patterning of thin cobalt films for magnetic storage J Vac Sci Technol B 12 1994 3196 3201
195. S.Y. Chou, P.R. Krauss, and P.J. Renstrom Imprint lithography with 25-nanometer resolution Science 272 1996 85 87
196. M. Colburn, S.C. Johnson, M.D. Stewart, S. Damle, T.C. Bailey, B. Choi, M. Wedlake, T.B. Michaelson, S.V. Sreenivasan, J.G. Ekerdt, and C.G. Willson Step and flash imprint lithography: a new approach to high-resolution patterning Proc SPIE 3676 1999 379 389
197. H. Schift Nanoimprint lithography: an old story in modern times? A review J Vac Sci Technol B 26 2008 458 480
198. G.M. Schmid, M. Miller, C. Brooks, N. Khusnatdinov, D. LaBrake, D.J. Resnick, S.V. Sreenivasan, G. Gauzner, K. Lee, D. Kuo, D. Weller, and X. Yang Step and flash imprint lithography for manufacturing patterned media J Vac Sci Technol B 27 2009 573 580
199. X.M. Yang, Y. Xu, C. Seiler, L. Wan, and S. Xiao Toward 1 Tdot/in.2 nanoimprint lithography for magnetic bit-patterned media: opportunities and challenges J Vac Sci Technol B 26 2008 2604 2610
200. X. Yang, S. Xiao, W. Wu, Y. Xu, K. Mountfield, R. Rottmayer, K. Lee, D. Kuo, and D. Weller Challenges in 1 teradot/in.2 dot patterning using electron beam lithography for bit- patterned media J Vac Sci Technol B 25 2007 2202 2209
201. X. Yang, S. Xiao, Y. Hsu, M. Feldbaum, K. Lee, and D. Kuo Directed self-assembly of block copolymer for bit patterned media with areal density of 1.5 teradot/inch2 and beyond J Nanomater 2013 2013 615896/1-615896/17
202. A. Kikitsu, T. Maeda, H. Hieda, R. Yamamoto, N. Kihara, and Y. Kamata 5 Tdots/in(2) bit patterned media fabricated by a directed self-assembly mask IEEE Trans Magn 49 2013 693 698
203. K. Naito, H. Hieda, M. Sakurai, Y. Kamata, and K. Asakawa 2.5-inch disk patterned media prepared by an artificially assisted self-assembling method IEEE Trans Magn 38 2002 1949 1951
204. Y. Kamata, A. Kikitsu, N. Kihara, S. Morita, K. Kimura, and H. Izumi Fabrication of ridgeand-groove servo pattern consisting of self-assembled dots for 2.5 Tb/in(2) bit patterned media IEEE Trans Magn 47 2011 51 54
205. C.A. Ross, and J.Y. Cheng Patterned magnetic media made by self-assembled blockcopolymer lithography MRS Bull 33 2008 838 845
206. M.E. Schabes Micromagnetic simulations for terabit/in(2) head/media systems J Magn Magn Mater 320 2008 2880 2884
207. R. Ruiz, E. Dobisz, and T.R. Albrecht Rectangular patterns using block copolymer directed assembly for high bit aspect ratio patterned media ACS Nano 5 2011 79 84
208. S. Hosaka, T. Akahane, M. Huda, T. Tamura, Y. Yin, N. Kihara, Y. Kamata, and A. Kitsutsu Long-range-ordering of self-assembled block copolymer nanodots using EB-drawn guide line and post mixing template Microelectron Eng 88 2011 2571 2575
209. R. Yamamoto, M. Kanamaru, K. Sugawara, N. Sasao, Y. Ootera, T. Okino, N. Kihara, Y. Kamata, and A. Kikitsu Orientation and position control of self-assembled polymer pattern for bit-patterned media IEEE Trans Magn 50 2014 47 50
210. S. Xiao, X. Yang, K.Y. Lee, J.J. Hwu, K. Wago, and D. Kuo Directed self-assembly for highdensity bit-patterned media fabrication using spherical block copolymers J Micro Nanolithogr MEMS MOEMS 12 2013 031110/1-031110/7
211. X. Yang, S. Xiao, Y. Hsu, H. Wang, J. Hwu, P. Steiner, K. Wago, K. Lee, and D. Kuo Fabrication of servo-integrated template for 1.5 teradot/inch2 bit patterned media with block copolymer directed assembly J Micro Nanolithogr MEMS MOEMS 13 2014 031307/1-031307/7
212. S.H. Anastasiadis, T.P. Russell, S.K. Satija, and C.F. Majkrzak Neutron reflectivity studies of the surface-induced ordering of diblock copolymer films Phys Rev Lett 62 1989 1852 1855
213. J. Lille, R. Ruiz, L. Wan, H. Gao, A. Dhanda, G. Zeltzer, T. Arnoldussen, K. Patel, Y. Tang, D. Kercher, and T.R. Albrecht Integration of servo and high bit aspect ratio data patterns on nanoimprint templates for patterned media IEEE Trans Magn 48 2012 2757 2760
214. G.L. Liu, P.F. Nealey, R. Ruiz, E. Dobisz, K.C. Patel, and T.R. Albrecht Fabrication of chevron patterns for patterned media with block copolymer directed assembly J Vac Sci Technol B 29 2011 06F204/1-06F204/7