Ordering poly(trimethylsilyl styrene-block- D,L -lactide) block copolymers in thin films by solvent annealing using a mixture of domain-selective solvents

Journal of Polymer Science, Part B: Polymer Physics

Volumn 52, Issue 1, 2014, Pages 36-45

  Cushen, Julia D ^a   Wan, Lei ^b   Pandav, Gunja ^a   Mitra, Indranil ^c   Stein, Gila E ^c   Ganesan, Venkat ^a   Ruiz, Ricardo ^b   Willson, C Grant ^a,d   Ellison, Christopher J ^a  

^a The University of Texas at Austin   (United States)

^b WESTERN DIGITAL CORPORATION   (United States)

^c UNIVERSITY OF HOUSTON   (United States)

^d University of Texas at Austin   (United States)

Author keywords

block copolymers; directed self assembly; lithography; self consistent field theory; solvent annealing; thin films

Indexed keywords

DEGREE OF SWELLING; DIRECTED SELF-ASSEMBLY; DOMAIN ORIENTATION; MIXTURE OF SOLVENTS; SELECTIVE SOLVENTS; SELF CONSISTENT FIELD THEORY; SOLVENT ANNEALING; TRIMETHYLSILYL;

ACETONE; ANNEALING; BLOCK COPOLYMERS; LITHOGRAPHY; MEAN FIELD THEORY; MIXTURES; MOLECULAR ORBITALS; STYRENE; THIN FILMS;

SOLVENTS;

EID: 84888432070     PISSN: 08876266     EISSN: 10990488     Source Type: Journal    
DOI: 10.1002/polb.23408     Document Type: Article

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