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Volumn 33, Issue 26, 2000, Pages 9575-9582

Guided self-assembly of symmetric diblock copolymer films on chemically nanopatterned substrates

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BLOCK COPOLYMERS; COPOLYMERS; DEPOSITION; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; POLYMETHYL METHACRYLATES; POLYSTYRENES; SUBSTRATES; SURFACE TOPOGRAPHY; THIN FILMS;

EID: 0034499627     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma001326v     Document Type: Article
Times cited : (163)

References (47)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.