Dense self-assembly on sparse chemical patterns: Rectifying and multiplying lithographic patterns using block copolymers

Advanced Materials

Volumn 20, Issue 16, 2008, Pages 3155-3158

  Cheng, Joy K ^a   Rettner, Charles T ^a   Sanders, Daniel P ^a   Kim, Ho Cheol ^a   Hinsberg, William D ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABS RESINS; BLOCK COPOLYMERS; CONTROL THEORY; COPOLYMERIZATION; COPOLYMERS; DATA STORAGE EQUIPMENT; DISTILLATION; PHOTORESISTS; PLASTIC PRODUCTS; POLYMERS; SELF ASSEMBLY; STYRENE;

CD VARIATIONS; CHEMICAL AFFINITIES; CHEMICAL CONTRASTS; CHEMICAL PATTERNS; CROSSLINKED FILMS; GUIDING; HIGHER FREQUENCIES; LITHOGRAPHIC PATTERNS; PATTERN RESOLUTIONS; RESIST PATTERNS; RESOLUTION ENHANCEMENTS; SPATIAL FREQUENCIES; THIN LAYERS; UNDERLAYER;

CROSSLINKING;

EID: 52649100977     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200800826     Document Type: Article

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