Bit-patterned magnetic recording: Theory, media fabrication, and recording performance

IEEE Transactions on Magnetics

Volumn 51, Issue 5, 2015, Pages

  Albrecht, Thomas R ^a   Arora, Hitesh ^a   Ayanoor Vitikkate, Vipin ^a   Beaujour, Jean Marc ^a   Bedau, Daniel ^a   Berman, David ^a   Bogdanov, Alexei L ^a   Chapuis, Yves Andre ^a   Cushen, Julia ^a   Dobisz, Elizabeth E ^a   Doerk, Gregory ^a   Gao, He ^a   Grobis, Michael ^a   Gurney, Bruce ^a   Hanson, Weldon ^a   Hellwig, Olav ^a   Hirano, Toshiki ^a   Jubert, Pierre Olivier ^a   Kercher, Dan ^a   Lille, Jeffrey ^a   Liu, Zuwei ^a   Mate, C Mathew ^a   Obukhov, Yuri ^a   Patel, Kanaiyalal C ^a   Rubin, Kurt ^a   Ruiz, Ricardo ^a   Schabes, Manfred ^a   Wan, Lei ^a   Weller, Dieter ^a   Wu, Tsai Wei ^a   Yang, En ^a   more..

^a WESTERN DIGITAL CORPORATION   (United States)

Author keywords

Areal density; bit patterned media; block copolymer; Co alloys; double patterning; e beam lithography; hard disk drive; interface anisotropy; magnetic multilayers; magnetic recording; nanoimprint lithography; prepatterned servo; self assembly; sequential infiltration synthesis; templated growth; thermal annealing; write synchronization

Indexed keywords

ALLOYS; BLOCK COPOLYMERS; COBALT ALLOYS; COPOLYMERS; DIGITAL STORAGE; ELECTRON BEAM LITHOGRAPHY; FABRICATION; GROWTH (MATERIALS); HARD DISK STORAGE; LITHOGRAPHY; MAGNETIC ANISOTROPY; MAGNETIC MATERIALS; MAGNETIC MULTILAYERS; MAGNETISM; NANOIMPRINT LITHOGRAPHY; SELF ASSEMBLY; SEMICONDUCTOR DEVICE MANUFACTURE; THERMODYNAMIC STABILITY;

AREAL DENSITIES; BIT-PATTERNED MEDIA; CO ALLOYS; DOUBLE PATTERNING; E-BEAM LITHOGRAPHY; HARD DISK DRIVE; INTERFACE ANISOTROPY; TEMPLATED GROWTH; THERMAL-ANNEALING;

MAGNETIC RECORDING;

EID: 84930656444     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2015.2397880     Document Type: Article

References (117)

1. D. A. Thompson and J. S. Best, "The future of magnetic data storage technology," IBM J. Res. Develop., vol. 44, no. 3, pp. 311-322, May 2000.
2. R. Wood, M. Williams, A. Kavcic, and J. Miles, "The feasibility of magnetic recording at 10 terabits per square inch on conventional media," IEEE Trans. Magn., vol. 45, no. 2, pp. 917-923, Feb. 2009.
3. M. H. Kryder et al., "Heat assisted magnetic recording," Proc. IEEE, vol. 96, no. 11, pp. 1810-1835, Nov. 2008.
4. J.-G. Zhu, X. Zhu, and Y. Tang, "Microwave assisted magnetic recording," IEEE Trans. Magn., vol. 44, no. 1, pp. 125-131, Jan. 2008.
5. S. Y. Chou, M. S. Wei, P. R. Krauss, and P. B. Fischer, "Single-domain magnetic pillar array of 35 nm diameter and 65 Gbits/in.2 density for ultrahigh density quantum magnetic storage," J. Appl. Phys., vol. 76, no. 10, pp. 6673-6675, Nov. 1994.
6. R. M. H. New, R. F. W. Pease, and R. L. White, "Submicron patterning of thin cobalt films for magnetic storage," J. Vac. Sci. Technol. B, vol. 12, no. 6, pp. 3196-3201, Nov. 1994.
7. T. R. Albrecht, O. Hellwig, R. Ruiz, M. E. Schabes, B. D. Terris, and X. Z. Wu, "Bit-patterned magnetic recording: Nanoscale magnetic islands for data storage," in Nanoscale Magnetic Materials and Applications, J. P. Liu, E. Fullerton, O. Gutfleisch, and D. J. Sellmyer, Eds. New York, NY, USA: Springer-Verlag, 2009, pp. 237-274.
8. B. Vasic and E. M. Kurtas, Eds., Coding and Signal Processing for Magnetic Recording Systems, vol. 2. Boca Raton, FL, USA: CRC Press, 2004.
9. H. J. Richter et al., "Recording on bit-patterned media at densities of 1 Tb/in2 and beyond," IEEE Trans. Magn., vol. 42, no. 10, pp. 2255-2260, Oct. 2006.
10. M. E. Schabes, "Micromagnetic simulations for terabit/in2 head/media systems," J. Magn. Magn. Mater., vol. 320, no. 22, pp. 2880-2884, Nov. 2008.
11. S. J. Greaves, Y. Kanai, and H. Muraoka, "Magnetic recording in patterned media at 5-10 Tb/in2," IEEE Trans. Magn., vol. 44, no. 11, pp. 3430-3433, Nov. 2008.
12. Y. Dong and R. H. Victora, "Micromagnetic specification for bit patterned recording at 4 Tbit/in2," IEEE Trans. Magn., vol. 47, no. 10, pp. 2652-2655, Oct. 2011.
13. E. C. Stoner and E. P. Wohlfarth, "A mechanism of magnetic hysteresis in heterogeneous alloys," Philos. Trans. Roy. Soc. A, vol. 240, no. 826, pp. 599-642, 1948.
14. D. Suess et al., "Exchange spring media for perpendicular recording," Appl. Phys. Lett., vol. 87, no. 1, p. 012504, Jul. 2005.
15. P. Krone, D. Makarov, T. Schrefl, and M. Albrecht, "Exchange coupled composite bit patterned media," Appl. Phys. Lett., vol. 97, no. 8, p. 082501, Aug. 2010.
16. T. R. Albrecht and M. E. Schabes, "Patterned magnetic media having an exchange bridge structure connecting islands," U.S. Patent 7 867 406 B2, Jan. 11, 2011.
17. M. V. Lubarda, S. Li, B. Livshitz, E. E. Fullerton, and V. Lomakin, "Reversal in bit patterned media with vertical and lateral exchange," IEEE Trans. Magn., vol. 47, no. 1, pp. 18-25, Jan. 2011.
18. S. Wang, Y. Wang, and R. H. Victora, "Shingled magnetic recording on bit patterned media at 10 Tb/in2," IEEE Trans. Magn., vol. 49, no. 7, pp. 3644-3647, Jul. 2013.
19. K. A. Rubin and B. D. Terris, "Patterned media having offset tracks," U.S. Patent 6 937 421 B2, Aug. 30, 2005.
20. H. Richter, A. Dobin, and D. Weller, "Data storage device with bit patterned media with staggered islands," U.S. Patent 2007 0 258 161 A1, Nov. 8, 2007.
21. B. D. Terris and T. Thomson, "Nanofabricated and self-assembled magnetic structures as data storage media," J. Phys. D, Appl. Phys., vol. 38, no. 12, p. R199, Jun. 2005.
22. J. Moritz et al., "Patterned media made from pre-etched wafers: A promising route toward ultrahigh-density magnetic recording," IEEE Trans. Magn., vol. 38, no. 4, pp. 1731-1736, Jul. 2002.
23. O. Hellwig et al., "Bit patterned media based on block copolymer directed assembly with narrow magnetic switching field distribution," Appl. Phys. Lett., vol. 96, no. 5, pp. 052511-1-052511-3, Feb. 2010.
24. O. Hellwig et al., "Suppression of magnetic trench material in bit patterned media fabricated by blanket deposition onto prepatterned substrates," Appl. Phys. Lett., vol. 93, no. 19, pp. 192501-1-192501-3, Nov. 2008.
25. O. Hellwig, L. J. Heyderman, O. Petracic, and H. Zabel, "Competing interactions in patterned and self-assembled magnetic nanostructures," in Magnetic Nanostructures, H. Zabel and M. Farle, Eds. Berlin, Germany: Springer-Verlag, 2013, pp. 189-234.
26. T. R. Albrecht et al., "Bit patterned media at 1 Tdot/in2 and beyond," IEEE Trans. Magn., vol. 49, no. 2, pp. 773-778, Feb. 2013.
27. D. Litvinov et al., "Recording physics, design considerations, and fabrication of nanoscale bit-patterned media," IEEE Trans. Nanotechnol., vol. 7, no. 4, pp. 463-476, Jul. 2008.
28. X. M. Yang, S. Xiao, Y. Hsu, M. Feldbaum, K. Lee, and D. Kuo, "Directed self-assembly of block copolymer for bit patterned media with areal density of 1.5 teradot/inch2 and beyond," J. Nanomater., vol. 2013, Sep. 2013, Art. ID 615896.
29. O. Hellwig et al., "Separating dipolar broadening from the intrinsic switching field distribution in perpendicular patterned media," Appl. Phys. Lett., vol. 90, no. 16, pp. 162516-1-162516-3, Apr. 2007.
30. J. M. Shaw, W. H. Rippard, S. E. Russek, T. Reith, and C. M. Falco, "Origins of switching field distributions in perpendicular magnetic nanodot arrays," J. Appl. Phys., vol. 101, no. 2, pp. 023909-1-023909-4, Jan. 2007.
31. I. Tagawa and Y. Nakamura, "Relationships between high density recording performance and particle coercivity distribution," IEEE Trans. Magn., vol. 27, no. 6, pp. 4975-4977, Nov. 1991.
32. J. Lee, C. Brombacher, J. Fidler, B. Dymerska, D. Suess, and M. Albrecht, "Contribution of the easy axis orientation, anisotropy distribution and dot size on the switching field distribution of bit patterned media," Appl. Phys. Lett., vol. 99, no. 6, pp. 062505-1-062505-3, Aug. 2011.
33. B. Pfau et al., "Origin of magnetic switching field distribution in bit patterned media based on pre-patterned substrates," Appl. Phys. Lett., vol. 99, no. 6, pp. 062502-1-062502-3, Aug. 2011.
34. J. W. Lau, R. D. McMichael, S. H. Chung, J. O. Rantschler, V. Parekh, and D. Litvinov, "Microstructural origin of switching field distribution in patterned Co/Pd multilayer nanodots," Appl. Phys. Lett., vol. 92, no. 1, pp. 012506-1-012506-3, 2008.
35. B. Pfau et al., "Influence of stray fields on the switching-field distribution for bit-patterned media based on pre-patterned substrates," Appl. Phys. Lett., vol. 105, no. 13, pp. 132407-1-132407-5, Sep. 2014.
36. T. Hauet et al., "Role of reversal incoherency in reducing switching field and switching field distribution of exchange coupled composite bit patterned media," Appl. Phys. Lett., vol. 95, no. 26, pp. 262504-1-262504-3, Dec. 2009.
37. M. Asbahi, J. Moritz, B. Dieny, C. Gourgon, C. Perret, and R. J. M. van de Veerdonk, "Recording performances in perpendicular magnetic patterned media," J. Phys. D, Appl. Phys., vol. 43, no. 38, p. 385003, Sep. 2010.
38. O. Hellwig, E. E. Marinero, and D. K. Weller, "Patterned perpendicular magnetic recording medium with ultrathin oxide film and reduced switching field distribution," U.S. Patent 8 268 461 B1, Sep. 18, 2012.
39. O. Hellwig et al., "Bit patterned media optimization at 1 Tdot/in2 by post-annealing," J. Appl. Phys., vol. 116, no. 12, pp. 123913-1-123913-6, Sep. 2014.
40. T. Shimatsu et al., "High-potential magnetic anisotropy of CoPtCr-SiO2 perpendicular recording media," IEEE Trans. Magn., vol. 41, no. 2, pp. 566-571, Feb. 2005.
41. O. Hellwig et al., "Coercivity tuning in Co/Pd multilayer based bit patterned media," Appl. Phys. Lett., vol. 95, no. 23, pp. 232505-1-232505-3, Dec. 2009.
42. N. Nakajima et al., "Perpendicular magnetic anisotropy caused by interfacial hybridization via enhanced orbital moment in Co/Pt multilayers: Magnetic circular X-ray dichroism study," Phys. Rev. Lett., vol. 81, no. 23, pp. 5229-5232, Dec. 1998.
43. E. Yang et al., "Template assisted direct growth of 1Td/in2 bit patterned media," to be published.
44. G. S. Bales and A. Zangwill, "Macroscopic model for columnar growth of amorphous films by sputter deposition," J. Vac. Sci. Technol. A, vol. 9, no. 1, pp. 145-149, Jan. 1991.
45. V. Sundar, J. Zhu, D. E. Laughlin, and J.-G. Zhu, "Novel scheme for producing nanoscale uniform grains based on templated two-phase growth," Nano Lett., vol. 14, no. 3, pp. 1609-1613, Mar. 2014.
46. F. S. Bates and G. H. Fredrickson, "Block copolymer thermodynamics: Theory and experiment," Annu. Rev. Phys. Chem., vol. 41, no. 1, pp. 525-557, 1990.
47. C. T. Black et al., "Polymer self assembly in semiconductor microelectronics," IBM J. Res. Develop., vol. 51, no. 5, pp. 605-633, Sep. 2007.
48. D. B. Millward et al., "A comparison of the pattern transfer of line-space patterns from graphoepitaxial and chemoepitaxial block co-polymer directed self-assembly," Proc. SPIE, vol. 9054, pp. 90540M-1-90540M-14, Mar. 2014.
49. S. Xiao, X. Yang, K. Y. Lee, R. J. M. van der Veerdonk, D. Kuo, and T. P. Russell, "Aligned nanowires and nanodots by directed block copolymer assembly," Nanotechnology, vol. 22, no. 30, p. 305302, Jul. 2011.
50. J. Y. Cheng, C. T. Rettner, D. P. Sanders, H.-C. Kim, and W. D. Hinsberg, "Dense self-assembly on sparse chemical patterns: Rectifying and multiplying lithographic patterns using block copolymers," Adv. Mater., vol. 20, no. 16, pp. 3155-3158, Aug. 2008.
51. J. Y. Cheng et al., "Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist," ACS Nano, vol. 4, no. 8, pp. 4815-4823, Aug. 2010.
52. R. Ruiz, E. Dobisz, and T. R. Albrecht, "Rectangular patterns using block copolymer directed assembly for high bit aspect ratio patterned media," ACS Nano, vol. 5, no. 1, pp. 79-84, Jan. 2011.
53. C.-C. Liu et al., "Fabrication of lithographically defined chemically patterned polymer brushes and mats," Macromolecules, vol. 44, no. 7, pp. 1876-1885, Apr. 2011.
54. G. S. Doerk, J. Y. Cheng, C. T. Rettner, S. Balakrishnan, N. Arellano, and D. P. Sanders, "Deterministically isolated gratings through the directed self-assembly of block copolymers," Proc. SPIE, vol. 8680, pp. 86800Y-1-86800Y-8, Mar. 2013.
55. S. H. Anastasiadis, T. P. Russell, S. K. Satija, and C. F. Majkrzak, "Neutron reflectivity studies of the surface-induced ordering of diblock copolymer films," Phys. Rev. Lett., vol. 62, pp. 1852-1855, Apr. 1989.
56. L. Wan et al., "The limits of lamellae-forming PS-b-PMMA block copolymers for lithography," to be published.
57. S. Park et al., "Macroscopic 10-terabit-per-square-inch arrays from block copolymers with lateral order," Science, vol. 323, no. 5917, pp. 1030-1033, Feb. 2009.
58. V. R. Tirumala, A. Romang, S. Agarwal, E. K. Lin, and J. J. Watkins, "Well ordered polymer melts from blends of disordered triblock copolymer surfactants and functional homopolymers," Adv. Mater., vol. 20, no. 9, pp. 1603-1608, May 2008.
59. H. Yaegashi, K. Oyama, A. Hara, S. Natori, and S. Yamauchi, "Overview: Continuous evolution on double-patterning process," Proc. SPIE, vol. 8325, pp. 83250B-1-83250B-8, Mar. 2012.
60. P. Mansky, Y. Liu, E. Huang, T. P. Russell, and C. Hawker, "Controlling polymer-surface interactions with random copolymer brushes," Science, vol. 275, no. 5305, pp. 1458-1460, Mar. 1997.
61. Y. Tada et al., "Directed self-assembly of POSS containing block copolymer on lithographically defined chemical template with morphology control by solvent vapor," Macromolecules, vol. 45, no. 1, pp. 292-304, Jan. 2012.
62. Y. S. Jung and C. A. Ross, "Solvent-vapor-induced tunability of selfassembled block copolymer patterns," Adv. Mater., vol. 21, no. 24, pp. 2540-2545, Jun. 2009.
63. J. D. Cushen et al., "Ordering poly(trimethylsilyl styreneblock-D, L-lactide) block copolymers in thin films by solvent annealing using a mixture of domain-selective solvents," J. Polym. Sci. B, Polym. Phys., vol. 52, no. 1, pp. 36-45, Jan. 2014.
64. A. Kikitsu, T. Maeda, H. Hieda, R. Yamamoto, N. Kihara, and Y. Kamata, "5 Tdots/in2 bit patterned media fabricated by a directed self-assembly mask," IEEE Trans. Magn., vol. 49, no. 2, pp. 693-698, Feb. 2013.
65. M. R. Hammond, E. Cochran, G. H. Fredrickson, and E. J. Kramer, "Temperature dependence of order, disorder, and defects in laterally confined diblock copolymer cylinder monolayers," Macromolecules, vol. 38, no. 15, pp. 6575-6585, Jul. 2005.
66. C. A. Ross and J. Y. Cheng, "Patterned magnetic media made by selfassembled block-copolymer lithography," MRS Bull., vol. 33, no. 9, pp. 838-845, Sep. 2008.
67. K. A. Cavicchi, K. J. Berthiaume, and T. P. Russell, "Solvent annealing thin films of poly(isoprene-b-lactide)," Polymer, vol. 46, no. 25, pp. 11635-11639, Nov. 2005.
68. B. Gong, Q. Peng, J. S. Jur, C. K. Devine, K. Lee, and G. N. Parsons, "Sequential vapor infiltration of metal oxides into sacrificial polyester fibers: Shape replication and controlled porosity of microporous/mesoporous oxide monoliths," Chem. Mater., vol. 23, no. 15, pp. 3476-3485, Jul. 2011.
69. C. M. Bates et al., "Polarity-switching top coats enable orientation of sub-10-nm block copolymer domains," Science, vol. 338, pp. 775-779, Nov. 2012.
70. H. Yoshida et al., "Topcoat approaches for directed self-assembly of strongly segregating block copolymer thin films," J. Photopolym. Sci. Technol., vol. 26, no. 1, pp. 55-58, 2013.
71. A. Vora et al., "Directed self-assembly of topcoat-free, integrationfriendly high block copolymers," J. Photopolym. Sci. Technol., vol. 27, no. 4, pp. 419-424, 2014.
72. C. Bencher et al., "Self-assembly patterning for sub-15 nm halfpitch: A transition from lab to fab," Proc. SPIE, vol. 7970, pp. 79700F-1-79700F-9, Apr. 2011.
73. C. Bencher et al., "Directed self-assembly defectivity assessment. Part II," Proc. SPIE, vol. 8323, pp. 83230N-1-83230N-10, Mar. 2012.
74. X. Yang, L. Wan, S. Xiao, Y. Xu, and D. K. Weller, "Directed block copolymer assembly versus electron beam lithography for bit-patterned media with areal density of 1 terabit/inch2 and beyond," ACS Nano, vol. 3, no. 7, pp. 1844-1858, Jul. 2009.
75. G. Liu, P. F. Nealey, R. Ruiz, E. Dobisz, K. C. Patel, and T. R. Albrecht, "Fabrication of chevron patterns for patterned media with block copolymer directed assembly," J. Vac. Sci. Technol. B, vol. 29, no. 6, p. 06F204, Nov. 2011.
76. S. Xiao, X. Yang, J. J. Hwu, K. Y. Lee, and D. Kuo, "A facile route to regular and nonregular dot arrays by integrating nanoimprint lithography with sphere-forming block copolymer directed selfassembly," J. Polym. Sci. B, Polym. Phys., vol. 52, no. 5, pp. 361-367, Mar. 2014.
77. B. D. Bunday et al., "Determination of optimal parameters for CD-SEM measurement of line-edge roughness," Proc. SPIE, vol. 5375, pp. 515-533, May 2004.
78. K. W. Guarini, C. T. Black, K. R. Milkove, and R. L. Sandstrom, "Nanoscale patterning using self-assembled polymers for semiconductor applications," J. Vac. Sci. Technol. B, vol. 19, no. 6, pp. 2784-2788, Nov. 2001.
79. H.-Y. Tsai et al., "Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly," J. Vac. Sci. Technol. B, vol. 30, no. 6, pp. 06F205-1-06F205-6, Nov. 2012.
80. S. M. George, "Atomic layer deposition: An overview," Chem. Rev., vol. 110, no. 1, pp. 111-131, Jan. 2010.
81. Q. Peng, Y.-C. Tseng, S. B. Darling, and J. W. Elam, "Nanoscopic patterned materials with tunable dimensions via atomic layer deposition on block copolymers," Adv. Mater., vol. 22, no. 45, pp. 5129-5133, 2010.
82. Q. Peng, Y.-C. Tseng, S. B. Darling, and J. W. Elam, "A route to nanoscopic materials via sequential infiltration synthesis on block copolymer templates," ACS Nano, vol. 5, no. 6, pp. 4600-4606, 2011.
83. Y.-C. Tseng, Q. Peng, L. E. Ocola, D. A. Czaplewski, J. W. Elam, and S. B. Darling, "Enhanced polymeric lithography resists via sequential infiltration synthesis," J. Mater. Chem., vol. 21, no. 32, pp. 11722-11725, Aug. 2011.
84. R. Ruiz et al., "Image quality and pattern transfer in directed self assembly with block-selective atomic layer deposition," J. Vac. Sci. Technol. B, Microelectron. Nanometer Struct., vol. 30, no. 6, pp. 06F202-1-06F202-6, Nov. 2012.
85. C. Bencher, Y. Chen, H. Dai, W. Montgomery, and L. Huli, "22 nm half-pitch patterning by CVD spacer self alignment double patterning (SADP)," Proc. SPIE, vol. 6924, pp. 69244E-1-69244E-7, Mar. 2008.
86. W. Shiu et al., "Advanced self-aligned double patterning development for sub-30-nm DRAM manufacturing," Proc. SPIE, vol. 7274, pp. 72740E-1-72740E-7, Mar. 2009.
87. S. Xiao et al., "Servo-integrated patterned media by hybrid directed self-assembly," ACS Nano, vol. 8, no. 11, pp. 11854-11859, Nov. 2014.
88. R. A. Gottscho, C. W. Jurgensen, and D. J. Vitkavage, "Microscopic uniformity in plasma etching," J. Vac. Sci. Technol. B, vol. 10, no. 5, pp. 2133-2147, Sep. 1992.
89. D. C. Gray, V. Mohindra, and H. H. Sawin, "Redeposition kinetics in fluorocarbon plasma etching," J. Vac. Sci. Technol. A, Vac., Surf., Films, vol. 12, no. 2, pp. 354-364, Mar. 1994.
90. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, "Imprint lithography with 25-nanometer resolution," Science, vol. 272, no. 5258, pp. 85-87, Apr. 1996.
91. D. J. Resnick et al., "Imprint lithography for integrated circuit fabrication," J. Vac. Sci. Technol. B, Microelectron. Nanometer Struct., vol. 21, no. 6, pp. 2624-2631, Nov. 2003.
92. E. A. Costner, M. W. Lin, W.-L. Jen, and C. G. Willson, "Nanoimprint lithography materials development for semiconductor device fabrication," Annu. Rev. Mater. Res., vol. 39, no. 1, pp. 155-180, 2009.
93. S. Y. Chou, P. R. Krauss, and L. Kong, "Nanolithographically defined magnetic structures and quantum magnetic disk (invited)," J. Appl. Phys., vol. 79, no. 8, pp. 6101-6106, Apr. 1996.
94. C. Brooks et al., "Development of template and mask replication using jet and flash imprint lithography," Proc. SPIE, vol. 7823, pp. 78230O-1-78230O-8, Sep. 2010.
95. S. Singh, S. Chen, P. Dress, N. Kurataka, G. Gauzner, and U. Dietze, "Advanced cleaning of nano-imprint lithography template in patterned media applications," Proc. SPIE, vol. 7823, pp. 78232T-1-78232T-9, Sep. 2010.
96. F. Rose et al., "Complete characterization by Raman spectroscopy of the structural properties of thin hydrogenated diamond-like carbon films exposed to rapid thermal annealing," J. Appl. Phys., vol. 116, no. 12, p. 123516, Sep. 2014.
97. C. Chappert et al., "Planar patterned magnetic media obtained by ion irradiation," Science, vol. 280, no. 5371, pp. 1919-1922, Jun. 1998.
98. C. Choi, Y. Yoon, D. Hong, Y. Oh, F. E. Talke, and S. Jin, "Planarization of patterned magnetic recording media to enable head flyability," Microsyst. Technol., vol. 17, no. 3, pp. 395-402, Mar. 2011.
99. L. Li and D. B. Bogy, "Dynamics of air bearing sliders flying on partially planarized bit patterned media in hard disk drives," Microsyst. Technol., vol. 17, nos. 5-7, pp. 805-812, Jun. 2011.
100. N. Toyoda et al., "Fabrication of planarized discrete track media using gas cluster ion beams," IEEE Trans. Magn., vol. 46, no. 6, pp. 1599-1602, Jun. 2010.
101. B. Marchon, T. Pitchford, Y.-T. Hsia, and S. Gangopadhyay, "The head-disk interface roadmap to an areal density of 4 Tbit/in2," Adv. Tribol., vol. 2013, Feb. 2013, Art. ID 521086.
102. C. M. Mate, Q. Dai, R. N. Payne, B. E. Knigge, and P. Baumgart, "Will the numbers add up for sub-7-nm magnetic spacings? Future metrology issues for disk drive lubricants, overcoats, and topographies," IEEE Trans. Magn., vol. 41, no. 2, pp. 626-631, Feb. 2005.
103. T. Shiramatsu et al., "Drive integration of active flying-height control slider with micro thermal actuator," IEEE Trans. Magn., vol. 42, no. 10, pp. 2513-2515, Oct. 2006.
104. C. M. Mate, O. J. Ruiz, R.-H. Wang, B. Feliss, X. Bian, and S.-L. Wang, "Tribological challenges of flying recording heads over unplanarized patterned media," IEEE Trans. Magn., vol. 48, no. 11, pp. 4448-4451, Nov. 2012.
105. M. Duwensee, S. Suzuki, J. Lin, D. Wachenschwanz, and F. E. Talke, "Air bearing simulation of discrete track recording media," IEEE Trans. Magn., vol. 42, no. 10, pp. 2489-2491, Oct. 2006.
106. A. N. Murthy, M. Duwensee, and F. E. Talke, "Numerical simulation of the head/disk interface for patterned media," Tribol. Lett., vol. 38, no. 1, pp. 47-55, Apr. 2010.
107. K. S. Myo, W. Zhou, S. Yu, and W. Hua, "Direct Monte Carlo simulations of air bearing characteristics on patterned media," IEEE Trans. Magn., vol. 47, no. 10, pp. 2660-2663, Oct. 2011.
108. J. Li, J. Xu, and M. Kobayashi, "Slider dynamics over a discrete track medium with servo patterns," Tribol. Lett., vol. 42, no. 2, pp. 233-239, May 2011.
109. J. Hanchi, P. Sonda, and R. Crone, "Dynamic fly performance of air bearing sliders on patterned media," IEEE Trans. Magn., vol. 47, no. 1, pp. 46-50, Jan. 2011.
110. J. Kalezhi, S. J. Greaves, Y. Kanai, M. E. Schabes, M. Grobis, and J. J. Miles, "A statistical model of write-errors in bit patterned media," J. Appl. Phys., vol. 111, no. 5, p. 053926, Mar. 2012.
111. A. Moser, D. Weller, M. E. Best, and M. F. Doerner, "Dynamic coercivity measurements in thin film recording media using a contact write/read tester," J. Appl. Phys., vol. 85, no. 8, pp. 5018-5020, Apr. 1999.
112. M. Grobis et al., "Measurements of the write error rate in bit patterned magnetic recording at 100-320 Gb/in2," Appl. Phys. Lett., vol. 96, no. 5, pp. 052509-1-052509-3, Feb. 2010.
113. M. K. Grobis, O. Hellwig, T. Hauet, E. Dobisz, and T. R. Albrecht, "High-density bit patterned media: Magnetic design and recording performance," IEEE Trans. Magn., vol. 47, no. 1, pp. 6-10, Jan. 2011.
114. Y. Obukhov, P.-O. Jubert, and M. K. Grobis, "Bit error rate computation for high areal density magnetic bit patterned media," to be published.
115. H. J. Richter, A. Lyberatos, U. Nowak, R. F. L. Evans, and R. W. Chantrell, "The thermodynamic limits of magnetic recording," J. Appl. Phys., vol. 111, no. 3, pp. 033909-1-033909-9, Feb. 2012.
116. B. C. Stipe et al., "Magnetic recording at 1.5 Pb m-2 using an integrated plasmonic antenna," Nature Photon., vol. 4, no. 7, pp. 484-488, Jul. 2010.
117. S. Pisana et al., "Measurement of the Curie temperature distribution in FePt granular magnetic media," Appl. Phys. Lett., vol. 104, no. 16, pp. 162407-1-162407-5, Apr. 2014.