5 Tdots/in2 bit patterned media fabricated by a directed self-assembly mask

IEEE Transactions on Magnetics

Volumn 49, Issue 2, 2013, Pages 693-698

  Kikitsu, Akira ^a   Maeda, Tomoyuki ^a   Hieda, Hiroyuki ^a   Yamamoto, Ryosuke ^a   Kihara, Naoko ^a   Kamata, Yoshiyuki ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Bit patterned media; diblock copolymer; directed self assembling; FePt; switching field

Indexed keywords

A-CARBON; BIT-PATTERNED MEDIA; DIRECTED SELF-ASSEMBLY; DOMAIN WALL MOTION; FEATURE SIZES; FEPT; FEPT FILMS; FEPT LAYERS; MAGNETIC ANISOTROPY ENERGY; MAGNETIC CHARACTERISTIC; MAGNETIC FIELD ANGLE; PATTERN TRANSFERS; POLYDIMETHYLSILOXANE PDMS; POLYMER MASKS; SELF-ASSEMBLED; SELF-ASSEMBLING; SOLVENT VAPORS; SWITCHING FIELD; SWITCHING FIELD DISTRIBUTION;

BLOCK COPOLYMERS; DOMAIN WALLS; ETCHING; MAGNETIZATION REVERSAL; POLYSTYRENES; SILICONES; VAPORS;

FABRICATION;

EID: 84873832249     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2012.2226566     Document Type: Article

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