The Limits of Lamellae-Forming PS- b -PMMA Block Copolymers for Lithography

ACS Nano

Volumn 9, Issue 7, 2015, Pages 7506-7514

  Wan, Lei ^a   Ruiz, Ricardo ^a   Gao, He ^a   Patel, Kanaiyalal C ^a   Albrecht, Thomas R ^a   Yin, Jian ^b   Kim, Jihoon ^b   Cao, Yi ^b   Lin, Guanyang ^b  

^a WESTERN DIGITAL CORPORATION   (United States)

^b EMD Performance Materials Corp   (United States)

Author keywords

bit patterned media; block copolymer lithography; lamellae; nanoimprint template fabrication; pattern transfer; PS b PMMA; rotary e beam lithography

Indexed keywords

BLOCK COPOLYMERS; CONTRAST MEDIA; ELECTRON BEAM LITHOGRAPHY; INTERFACES (MATERIALS); LITHOGRAPHY; NANOIMPRINT LITHOGRAPHY; SELF ASSEMBLY;

BIT-PATTERNED MEDIA; BLOCK COPOLYMER LITHOGRAPHY; E-BEAM LITHOGRAPHY; LAMELLAE; PATTERN TRANSFERS; TEMPLATE FABRICATION;

HARD DISK STORAGE;

EID: 84938118618     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/acsnano.5b02613     Document Type: Article

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