Using self-assembled monolayers exposed to X-rays to control the wetting behavior of thin films of diblock copolymers

Langmuir

Volumn 16, Issue 10, 2000, Pages 4625-4631

  Peters, Richard D ^a   Yang, Xiao M ^a   Kim, Tae K ^a   Sohn, B H ^a   Nealey, Paul F ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; CHEMICAL MODIFICATION; INTERFACIAL ENERGY; MATHEMATICAL MODELS; MOLECULAR WEIGHT; MONOLAYERS; MORPHOLOGY; POLYMETHYL METHACRYLATES; POLYSTYRENES; SURFACE TENSION; WETTING; X RAYS;

OCTADECYL TRICHLOROSILANE; POLARITY; POLYMER FILMS; SELF ASSEMBLED MONOLAYERS;

THIN FILMS;

EID: 0034188632     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la991500c     Document Type: Article

References (40)