Exploration of suitable dry etch technologies for directed self-assembly

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8328, Issue , 2012, Pages

  Yamashita, Fumiko ^a   Nishimura, Eiichi ^a   Yatsuda, Koichi ^b   Mochiki, Hiromasa ^b   Bannister, Julie ^c  

^a Tokyo Electron Miyagi Ltd   (Japan)

^b TOKYO ELECTRON LTD   (Japan)

^c TOKYO ELECTRON AMERICA INC   (United States)

Author keywords

block co polymer (BCP); capacitively coupled plasma (CCP); directed self assembly (DSA); inductively coupled plasma (ICP); ion energy distribution (IED); line edge roughness (LER); line width roughness (LWR)

Indexed keywords

CAPACITIVELY-COUPLED PLASMA (CCP); DIRECTED SELF-ASSEMBLY; ION ENERGY DISTRIBUTIONS; LINE EDGE ROUGHNESS; LINEWIDTH ROUGHNESS;

DISSOCIATION; INDUCTIVELY COUPLED PLASMA; PHOTORESISTS; POLYMERS; POLYMETHYL METHACRYLATES; POLYSTYRENES; SELF ASSEMBLY;

ROUGHNESS MEASUREMENT;

EID: 84875133781     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.916349     Document Type: Conference Paper

References (1)

1. Lide, D.R., ed. [CRC Handbook of Chemistry and Physics] (86th ed.), CRC Press, Boca Raton, Fl (2005