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Advanced Materials

Volumn 19, Issue 4, 2007, Pages 607-611

Directed assembly of lamellae-forming block copolymers by using chemically and topographically patterned substrates

(6) Park, Sang Min a Stoykovich, Mark P a Ruiz, Ricardo b Zhang, Ying b Black, Charles T b Nealey, Paul F a

a University of Wisconsin Madison (United States)

b IBM T J WATSON RESEARCH CENTER (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; MORPHOLOGY; POLYMER FILMS; SUBSTRATES; TOLUENE;

COPOLYMERS MORPHOLOGY; GRAPHOEPITAXY TECHNIQUE; NEUTRAL WETTING;

BLOCK COPOLYMERS;

EID: 34250677782 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/adma.200601421 Document Type: Article

Times cited : (213)

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