Post-decomposition assessment of double patterning layout

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Rubinstein, Juliet ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Decomposition; Double patterning; Layout

Indexed keywords

ASSESSMENT TOOLS; CAD TOOLS; DOUBLE PATTERNING; HOT SPOT DETECTION; INDIVIDUAL (PSS 544-7); MATCHING METHODS; OPTICAL MICRO LITHOGRAPHY; PATTERN DECOMPOSITION; PROCESS WINDOWS; SUB-LAYERS; TO MANY;

EDGE DETECTION; LITHOGRAPHY; MATHEMATICAL MODELS; PATTERN MATCHING; WINDOWS;

COMPUTER AIDED DESIGN;

EID: 45449104989     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772891     Document Type: Conference Paper

References (6)

1. G. Bailey et al., "Double Pattern EDA Solutions for 32nm HP and beyond", Proceedings of the SPIE, Volume 6521, pp. 65211K (2007)
2. M. Drapeau, V. Wiaux, E. Hendrickx, S Verhaegen and T Macida, "Double patterning design split implementation and validation for the 32nm node", Proceedings of the SPIE, Volume 6521, pp. 652109 (2007)
3. G. Mcintyre, J. Holwill and A. R. Neureuther, "Screening layouts for high-numerical aperture and polarization effects using pattern matching", Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Volume 23, Issue 6, pp. 2646-2652 (2005)
4. J. Holwill, G. Mcintyre, W. Poppe and A. R. Neureuther, "Layout 'hot spots' for advancing optical technologies", Proceedings of the SPIE, Volume 6154, pp. 1212-1220 (2006)
5. F. Gennari and A. Neureuther, "A Pattern Matching System for Linking TCAD and EDA", Proceedings of the 5th International Symposium on Quality Electronic Design, p 165-170 (2004)
6. Garth Robins, Konstantinos Adam, and Andrew Neureuther, "Measuring optical image aberrations with pattern and probe based targets", J. Vac. Sci. Technol. B 20, 338 (2002)