Line-frequency doubling of directed self-assembly patterns for single-digit bit pattern media lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8323, Issue , 2012, Pages

  Patel, K C ^a   Ruiz, R ^a   Lille, J ^a   Wan, L ^a   Dobiz, E ^a   Gao, H ^a   Robertson, N ^a   Albrecht, T R ^a  

^a HITACHI AMERICA LTD   (United States)

Author keywords

Block copolymer; Line doubling; Patterned media; PS b PMMA; Self assembly; Spacer

Indexed keywords

BLOCK COPOLYMERS; ESTERS; INDUSTRIAL APPLICATIONS; SELF ASSEMBLY;

BIT-PATTERNED MEDIA; DIRECTED SELF-ASSEMBLY; LINE DOUBLING; LITHOGRAPHIC PROCESS; PATTERNED MEDIAS; PS-B-PMMA; SELF-ASSEMBLING MATERIALS; SPACER;

LITHOGRAPHY;

EID: 84873840745     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.916589     Document Type: Conference Paper

References (16)

1. M. Dusa et al., "Pitch doubling through dual patterning lithography challenges in integration and Lithography budgets", Proc. SPIE vol. 6520, 65200G, (2007).
2. C. P. Ausschnitt and S. D. Halle, "Combinatorial overlay control for double patterning," J. Micro-Nanolithography. MEMS MOEMS 8 (1), 8 (2009).
3. H. Yaegashi, "The self aligned spacer DP process towards 11nm node and beyond", Lithography workshop, Lihue, Kauai, November (2010).
4. Chris Bencher et al., "SADP: The Best Option for ≤32nm NAND Flash", Nanochip Technology Journal 2, 8-13 (2007).
5. W. Jung et al., "Patterning with amorphous carbon spacer for expanding the resolution limit of current lithographic tool", Proc. SPIE vol. 6520, 65201C, (2007).
6. C. T. Black and R. Ruiz, presented at the SPIE-Advances in Resist Technology and Processing XXIII (unpublished) (2006).
7. M. P. Stoykovich, M. Muller, S. O. Kim et al., "Directed assembly of block copolymer blends into nonregular device-oriented structures," Science 308 (5727), 1442-1446 (2005).
8. Ruiz, R.; Kang, H.; Detcheverry, F. A.; Dobisz, E.; Kercher, D. S.; Albrecht, T. R.; de Pablo, J. J.; Nealey, P. F., "Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly". Science, 321, 936-939 (2008).
9. Cheng, J. Y.; Rettner, C. T.; Sanders, D. P.; Kim, H.-C.; Hinsberg, W. D., "Dense Self-Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers". Advanced Materials 20, 3155-3158 (2008).
10. Park, S.; Lee, D. H.; Xu, J.; Kim, B.; Hong, S. W.; Jeong, U.; Xu, T.; Russell, T. P., "Macroscopic 10-Terabit-per-Square- Inch Arrays from Block Copolymers with Lateral Order". Science 323, 1030-1033 (2009)
11. Tada, Y.; Yoshida, H.; Ishida, Y.; Hirai, T.; Bosworth, J. K.; Dobisz, E.; Ruiz, R.; Takenaka, M.; Hayakawa, T.; Hasegawa, H., "Directed Self-Assembly of POSS Containing Block Copolymer on Lithographically Defined Chemical Template with Morphology Control by Solvent Vapor". Macromolecules 45, 292-304 (2011).
12. Lei Wan, Ricardo Ruiz, He Gao, Kanaiyalal C. Patel, Jeffery Lille, Gabriel Zeltzer, Elizabeth A. Dobisz, Paul F. Nealey, Thomas R. Albrecht; "Fabrication of Templates with Rectangular Bits on Circular Tracks by Combining Directed Block Copolymer Self-Assembly and Nanoimprint Lithography" SPIE conference (2012).
13. Yang, X. M.; Xu, Y.; Lee, K.; Xiao, S. G.; Ku, D.; Weller, D., "Advanced Lithography for Bit Patterned Media". IEEE Transactions on Magnetics, 2009, 45, 833-838 (2009).
14. Michael D. Austin, Haixiong Ge, Wei Wu, Mingtao Li, Zhaoning Yu, D. Wasserman, S. A. Lyon, and Stephen Y. Chou; "Fabrication of nm 5 linewidth and nm 14 pitch features by nanoimprint lithography", Appl. Phys. Letters 84, 5299 (2004).
15. Ruiz, R.; Dobisz, E.; Albrecht, T. R., "Rectangular Patterns Using Block Copolymer Directed Assembly for High Bit Aspect Ratio Patterned Media". ACS Nano 5, 79-84 (2011).
16. Thurn-Albrecht, T.; Steiner, R.; DeRouchey, J.; Stafford, C. M.; Huang, E.; Bal, M.; Tuominen, M.; Hawker, C. J.; Russell, T. P., "Nanoscopic templates from oriented block copolymer films", Advanced Materials 12, 787-791 (2000).