In situ tracking of microstructure spacing and ordered domain compression during the drying of solution-cast block copolymer films using small-angle X-ray scattering

Macromolecules

Volumn 45, Issue 8, 2012, Pages 3480-3486

  Heinzer, Michael J ^a   Han, Sangil ^a   Pople, John A ^b   Baird, Donald G ^a   Martin, Stephen M ^a  

^a Virginia Polytechnic Institute and State University   (United States)

^b SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMER FILMS; CHAIN RELAXATION; COPOLYMER FILMS; DIFFERENT SOLVENTS; DOMAIN COMPRESSION; DRYING TEMPERATURE; FILM SURFACES; IN-SITU; MICRO-DOMAINS; ORDERED DOMAINS; PACKED CYLINDERS; POLYMER CHAINS; POLYMER CONCENTRATIONS; SMALL ANGLE X-RAY SCATTERING; SOLUTION-CAST; SOLVENT REMOVAL; SWEEP GAS;

BLOCK COPOLYMERS; SOLVENTS; TOLUENE; X RAY SCATTERING;

ORGANIC SOLVENTS;

EID: 84860213334     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma2026435     Document Type: Article

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