Fabrication of lithographically defined chemically patterned polymer brushes and mats

Macromolecules

Volumn 44, Issue 7, 2011, Pages 1876-1885

  Liu, Chi Chun ^a   Han, Eungnak ^a   Onses, M Serdar ^a   Thode, Christopher J ^a   Ji, Shengxiang ^a   Gopalan, Padma ^a   Nealey, Paul F ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AU NANOPARTICLE; CHEMICAL PATTERN; CROSS-LINKED POLYMERS; CROSS-LINKED POLYSTYRENE; DIRECTED ASSEMBLY; FINE-STRUCTURE SPECTROSCOPY; GRAFTED POLYMERS; HYDROXYL-TERMINATED; LENGTH SCALE; LITHOGRAPHIC PROCESSING; NANO SCALE; NEW MATERIAL; PATTERNED SURFACE; PMMA FILMS; POLY(2-VINYLPYRIDINE) (P2VP); POLYMER BRUSHES; POLYMER MAT; POLYSTYRENE-POLY(METHYL METHACRYLATE) (PS-PMMA); PRECISE DEFINITION; RANDOM COPOLYMER; SENSITIVE APPLICATION; SITE-SPECIFIC;

BLOCK COPOLYMERS; BRUSHES; COPOLYMERIZATION; CROSSLINKING; ESTERS; GOLD; GRAFTING (CHEMICAL); POLYMERS; POLYSTYRENES; WETTING;

POLYMER FILMS;

EID: 79953902554     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma102856t     Document Type: Article

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