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Volumn 8, Issue 24, 2012, Pages 3762-3768

Directed self-assembly with sub-100 degrees celsius processing temperature, sub-10 nanometer resolution, and sub-1 minute assembly time

(8) Park, Woon Ik a Kim, Kyungho a Jang, Hyun Ik b,c Jeong, Jae Won a Kim, Jong Min a Choi, Jaesuk a Park, Jae Hong b Jung, Yeon Sik a

a Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

b National Nano Fab Center (NNFC) (South Korea)

c University of Seoul (South Korea)

Author keywords

block copolymers; lithography; rapid assembly; self assembly

Indexed keywords

LITHOGRAPHY; PROCESSING; SELF ASSEMBLY; TEMPERATURE;

DIFFERENT GEOMETRY; DIRECTED SELF-ASSEMBLY; FLORY-HUGGINS INTERACTION PARAMETER; LOW TEMPERATURES; NANOMETER RESOLUTIONS; PROCESSING TEMPERATURE; SOLVENT ANNEALING; THERMAL ASSISTANCE;

BLOCK COPOLYMERS;

EID: 84872967848 PISSN: 16136810 EISSN: 16136829 Source Type: Journal
DOI: 10.1002/smll.201201407 Document Type: Article

Times cited : (87)

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