Directed self-assembly of block copolymer for bit patterned media with areal density of 1.5 Teradot/Inch2 and beyond

Journal of Nanomaterials

Volumn 2013, Issue , 2013, Pages

  Yang, Xiaomin ^a   Xiao, Shuaigang ^a   Hsu, Yautzong ^a   Feldbaum, Michael ^a   Lee, Kim ^a   Kuo, David ^a  

^a SEAGATE TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; ESTERS; FABRICATION; NANOIMPRINT LITHOGRAPHY; PHOTORESISTS; STYRENE; TWO DIMENSIONAL;

BIT-PATTERNED MEDIA; BIT-PATTERNED MEDIA (BPM); DIRECTED SELF-ASSEMBLY; ELECTRON BEAM MASTERING; FUSED SILICA SUBSTRATES; HEXAGONAL CLOSE-PACKED (HCP) STRUCTURES; NANOIMPRINT LITHOGRAPHY PROCESS; POLY(STYRENE-B-DIMETHYLSILOXANE);

SELF ASSEMBLY;

EID: 84896115503     PISSN: 16874110     EISSN: 16874129     Source Type: Journal    
DOI: 10.1155/2013/615896     Document Type: Article

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