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Advanced Materials

Volumn 13, Issue 15, 2001, Pages 1174-1178

Formation of a cobalt magnetic dot array via block copolymer lithography

(6) Cheng, J Y a Ross, C A a,c Chan, V Z H b Thomas, E L a Lammertink, R G H b Vancso, G J a

a Massachusetts Institute of Technology (United States)

b UNIVERSITY OF TWENTE (Netherlands)

c California Institute of Technology (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BLOCK COPOLYMERS; COBALT COMPOUNDS; COERCIVE FORCE; CRYSTALLIZATION; FILM GROWTH; MAGNETIC ANISOTROPY; MAGNETIZATION; MASKS; MULTILAYERS; NANOSTRUCTURED MATERIALS; PHASE SEPARATION; REACTIVE ION ETCHING; SELF ASSEMBLY; X RAY PHOTOELECTRON SPECTROSCOPY;

MAGNETIC DOT ARRAYS; MAGNETOSTATIC INTERACTIONS;

MAGNETIC THIN FILMS;

EID: 0035800425 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/1521-4095(200108)13:15<1174::AID-ADMA1174>3.0.CO;2-Q Document Type: Article

Times cited : (673)

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