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Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 29, Issue 6, 2011, Pages

Fabrication of chevron patterns for patterned media with block copolymer directed assembly

(6) Liu, Guoliang a Nealey, Paul F a Ruiz, Ricardo b Dobisz, Elizabeth b Patel, Kanaiyalal C b Albrecht, Thomas R b

a Wisconsin Electric Machines and Power Electronics Consortium (United States)

b SAN JOSE RESEARCH CENTER (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; CODES (SYMBOLS); DESIGN; HARD DISK STORAGE; NANOIMPRINT LITHOGRAPHY; SIGNAL PROCESSING;

BIT-PATTERNED MEDIA; BLOCK COPOLYMER FILMS; BLOCK COPOLYMER LITHOGRAPHY; CHEMICAL PATTERN; CHEVRON STRUCTURES; DATA BITS; DATA TRACKS; DEFECTIVE STRUCTURES; DIRECTED ASSEMBLY; HARD DISK DRIVE; HEAD POSITION; JUNCTION AREA; LAMELLAR DOMAIN; LITHOGRAPHIC MASK; PATTERNED MEDIAS; PERIODIC LINES; SERVO PATTERN; SIZE UNIFORMITY; STORAGE UNITS; ULTRAHIGH DENSITY;

PERIODIC STRUCTURES;

EID: 84255168828 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3650697 Document Type: Article

Times cited : (13)

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